Micromorph tandem solar cells grown at high rate with in-situ intermediate reflector in industrial KAI PECVD reactors

We report on the latest results of tandem micromorph (a-Si:H/μc-Si:H) silicon solar cells fabricated in commercial Oerlikon Solar KAI-S and KAI-M PECVD reactors. First developments of in-situ silicon oxide based intermediate reflector (SOIR) in KAI reactors are as well presented. Under low depletion conditions (silane concentration < 10%) our best micromorph solar cells achieve initial efficiencies up to 10.6% for a cell size > 1cm2, with a deposition rate of 0.55 nm/s for microcrystalline silicon and an ex-situ silicon oxide-based intermediate reflector (SOIR). Under high depletion conditions, the growth rate could be raised up to 1.2 nm/s, in a modified KAI-M reactor, and the highest initial efficiency reached so far is 9.7% with in-situ SOIR and top cell thickness of ∼ 230 nm. Promising micromorph solar cells are thus produced under conditions that are highly favorable to low-cost fabrication of tandem modules at an industrial level.

High-Quality Microcrystalline Silicon for Efficient Thin-Film Solar Cells

Grégory Bugnon

This thesis investigates the link between the plasma deposition conditions and microcrystalline silicon (μc-Si:H) material quality for thin-film silicon photovoltaic applications. The role of interfaces and the μc-Si:H material quality on the device performance are analyzed in detail. The low absorption of μc-Si:H at long wavelengths requires the deposition of absorber layers with thicknesses of typically a few micrometers for use in multi-junction TF Si solar cells. The growth typically takes place on highly textured surfaces, which provide increased light absorption—often called light trapping—but which potentially induce structural defects in the film during its growth. Therefore, to further improve the TF Si technology, one of the main challenges is the identification of the determinant plasma deposition parameters that result in the growth of very high-quality μc-Si:H at an increased deposition rate on textured substrates that guarantee efficient light trapping. As a first approach to better understand the plasma conditions necessary for the growth of high-quality μc-Si:H, the roles of both the silane depletion fraction and the deposition pressure are studied in an industrial-type large-area KAI reactor. With increasing pressure and silane depletion, the μc-Si:H defect density is significantly lowered leading to improved solar cell performance. An estimation of the average energy with which ions impinge on the substrate supports the hypothesis that ion bombardment is mainly responsible for the observed differences. Then, a fundamental aspect of μc-Si:H deposition on highly textured substrates is highlighted: two different phases of μc-Si:H material contribute to the overall solar cell efficiency, both of which can drive cell performance. The first phase relates to the bulk material and dominates the performance of cells on flat substrates. However, on rough morphologies, substrate-induced defective localized nanoporous regions—the second phase—develop and are found to be significantly more sensitive to the plasma process conditions and substrate morphology than the bulk phase. The relative importance of this secondary defective phase is shown through the use of new damp-heat experiments. Silicon oxide doped layers are demonstrated to mitigate the influence of these nanoporous regions on the solar cell performance. Next, a comparative study of the plasma excitation frequencies of 13.56 MHz (RF) and 40.68 MHz (VHF) shows that, while both allow for the growth of very good-quality bulk material, the efficiency of VHF-prepared cells is always poorer compared to that of RF-prepared cells within the range of our study for growth rates below 5 Å s−1. This decrease in solar cell performance is related to a higher density of nanoporous regions in the VHF-prepared cells as evidenced by damp-heat experiments, leading to strong open-circuit voltage instabilities. Still, the use of VHF is shown to be beneficial at increased deposition rates, thanks to reduced ion bombardment and improved bulk material quality. The crucial interplay between μc-Si:H growth rate and substrate morphology with regard to the formation of nanoporous regions is further discussed for regimes with high deposition rates of around 10 Ås−1. It is shown that high-silane-depletion regimes with significantly reduced H2 flow rate or increased pressure lead to a denser μc-Si:H material but are associated with increased secondary gas-phase reactions and powder formation. The use of a reduced interelectrode distance is demonstrated to allow for the growth of μc-Si:H with significantly improved bulk material quality at higher growth rates. Plasma simulations performed in collaboration with the University of Patras are presented and suggest that improvements observed in the μc-Si:H material quality are related mainly to an increased contribution of less reactive silane monoradicals, such as SiH3 and Si2H5, to the growing film, as compared to highly reactive ones such as SiH2 and SiH. Then, in an effort to better understand the formation of these two distinct μc-Si:H phases, the intrinsic stress within μc-Si:H i-layers is studied and correlated with the bulk defect density. Further improvements to both μc-Si:H and a-Si:H solar cells are obtained by introducing a novel intrinsic silicon oxide buffer layer at the p -i interface. For μc -Si:H solar cells, all electrical parameters are improved unless the i -layer is significantly more amorphous-rich and high quality, in which case an improvement only in carrier collection in the blue region is observed. In a-Si:H solar cells the silicon oxide buffer is shown to lower light-induced degradation, which is one of the weak points of TF Si technology. Furthermore, for both a-Si:H and μc-Si:H solar cells, the buffer can also act as an efficient barrier to boron cross-contamination, eliminating the need for additional time-consuming processing steps such as a water flush for single-chamber processes. Overall, this work contributes to a better understanding of the μc-Si:H material requirements for PV applications and how they relate to the plasma deposition conditions. Based on all the aforementioned developments, significant progress has been made in the understanding and the fabrication of thin-film silicon solar cells based on μc-Si:H. An outstanding single-junction μc-Si:H solar cell of 10.9% was attained; to our knowledge this is the highest reported in the literature. This work also contributed to the development of very high-efficiency tandem and triple-junction thin-film silicon solar cells at PV-Lab.

EPFL2013

Amorphous solar cells, the micromorph concept and the role of VHF-GD deposition technique

Arvind Shah, Joël Alexandre Spitznagel

During the last two decades, the Institute of Microtechnology (IMT) has contributed in two important fields to future thin-film silicon solar cell processing and design: (1) In 1987, IMT introduced the so-called "very high frequency glow discharge (VHF-GD)" technique, a method that leads to a considerable enhancement in the deposition rate of amorphous and microcrystalline silicon layers. As a direct consequence of reduced plasma impedances at higher plasma excitation frequencies, silane dissociation is enhanced and the maximum energy of ions bombarding the growing surface is reduced. Due to softer ion bombardment on the growing surface, the VHF process also favours the formation of microcrystalline silicon. Based on these beneficial properties of VHF plasmas, for the growth of thin silicon films, plasma excitation frequencies fexc in the range 30-300 MHz, i.e. clearly higher than the standard 13.56 MHz, are indeed scheduled to play an important role in future production equipment. (2) In 1994, IMT pioneered a novel thin-film solar cell, the microcrystalline silicon solar cell. This new type of thin-film absorber material - a form of crystalline silicon - opens up the way for a new concept, the so-called "micromorph" tandem solar cell concept. This term stands for the combination of a microcrystalline silicon bottom cell and an amorphous silicon top cell. Thanks to the lower band gap and to the stability of microcrystalline silicon solar cells, a better use of the full solar spectrum is possible, leading, thereby, to higher efficiencies than those obtained with solar cells based solely on amorphous silicon. Both the VHF-GD deposition technique and the "micromorph" tandem solar cell concept are considered to be essential for future thin-film PV modules, as they bear the potential for combining high-efficiency devices with low-cost manufacturing processes. ©2004 Elsevier Ltd. All rights reserved.

2004

Study of radio-frequency plasma deposition of amorphous silicon for the improvement of solar cell production

Juliette Ballutaud

Plasma enhanced chemical vapour deposition (PECVD) of thin films such as amorphous silicon has widespread applications especially in the field of photovoltaic solar cells and thin-film transistors for flat screen production. Industrial applications require high depositions rates over large areas with a good uniformity in layer thickness. In this thesis, some aspects of PECVD in large surface, industrial type, capacitive radio frequency reactor are investigated. The aim of this work is to study the plasma process conditions to increase the deposition rate of uniform, good quality, a-Si:H layer for solar cell application in a single chamber reactor. The studies realized during this thesis have necessitated the development and the comprehension of diagnostics such as deposition rate measurement by in-situ interferometry, plasma power measurement and layer density measurement by ellipsometry. During the thesis, we have also elaborated a matching-box circuit for using process frequencies of 27.12 MHz and 40.68 MHz. Deposition of a-Si:H in small electrode gap reactor has been studied. At present industrial reactors have a standard electrode gap of 2.4 cm. We modified a reactor to reach a small gap of 1.7 cm. It appears that we have obtained faster deposition rate in the small gap reactor but non-uniformity problems increase due to edge focusing and powder effects. One solution, based on a teflon jigsaw to keep the plasma away from the edge confined spaces, is proposed to suppress focusing effect but the operation parameter space is still reduced by the powder effect. Systematic measurements of a-Si:H layer density was also done by ellipsometry. It is shown that the layer density decreases when the deposition rate increases, independently of pressure, gas flow and frequency (27.12 MHz/40.68 MHz) of the plasma. At high deposition rate, 6 Å/s, only an increase of the process temperature from 200°C to 230°C can significantly improve the layer density. We have noted also a slight improvement of layer density for layers deposited in the small gap reactor. Nevertheless industrial constraints impose a process temperature of 200°C and a standard gap reactor. By optimising the process parameters, keeping the temperature process at 200°C, good quality, uniform, a-Si:H layer were deposited at 3 Å/s on 37 cm × 47 cm glass substrates at 40.68 MHz. A particular source of non-uniformity in large area reactor has been examined. In large area reactors, a perturbation in RF plasma potential, due to the electrode edge asymmetry, propagates towards the plasma center with a characteristic damping length λ. The variation of RF plasma potential at the edge implies a variation of the deposition rate across the reactor area and then a non-uniformity of the deposited layer. A theoretical study was done to understand of this phenomenon and experimental results confirmed the model. Finally, for solar cell applications, a study of the boron cross-contamination during solar cell deposition in a single chamber process has been done. During the deposition of the intrinsic layer, for a p-i-n cell, i-layer is contaminated by the residual boron radicals present in the reactor after the deposition of the boron-doped layer. This contamination decreases cell performance. Several reactor treatments have been tested to solve this contamination problem. The effectiveness of these treatments was evaluated by secondary ion mass microscopy (SIMS) measurements. It appears that an ammonia flush or a water vapour flush of a few minutes, between the deposition of the p-layer and i-layer, reduces the boron contamination at the p-i interface. The performance of cells made with these treatments, in a single chamber process, are comparable to performance of cells done in a multi-chamber process.

EPFL2004