Publication

Structural, optical and electronic properties of hydrogenated polymorphous silicon films deposited at 150 degrees C

Publications associées (64)

Investigations of radio-frequency, capacitively-coupled large area industrial reactor

The constant energy consumption and world-wide demography expansion add to the potential risks of ecological and human disaster associated with global warming. This makes it a necessity to develop renewable energy technologies such as photovoltaic energy. ...

EPFL2007

Microcrystalline silicon deposited at high rate on large areas from pure silane with efficient gas utilization

Christophe Ballif, Christoph Hollenstein, Alan Howling, Laurent Fabien Hubert Sansonnens, Benjamin Strahm

Microcrystalline silicon thin film deposited by RF-PECVD and integrated in a tandem structure is a promising material for low cost photovoltaic solar cells compared to solar cells based on crystalline silicon. However, in order to allow a cost-effective ma ...

2007

Erosion and deposition in the JET MkII-SRP divertor

Richard Pitts

Carbon-13 labelled methane was injected into the outer divertor during a series of H-mode discharges on the last day of operations with the JET MkII-SRP divertor. Tiles from around the vessel were removed during the subsequent shutdown and surface deposits ...

2007

Optical properties of metal-doped carbon based nanocomposite thin films: Comparing experiment to effective medium theories

Josef Andreas Schuler

Nanocomposite thin films exhibit interesting optical properties which differ from those of the pure constituents. Effective medium theories are used to model the dielectric function of the nanocomposite materials. We give an introduction to the theories of ...

2006

Low pressure chemical vapour deposition of ZnO layers for thin-film solar cells: Temperature-induced morphological changes

Arvind Shah, Cédric Bucher, Sylvie Faÿ

Zinc oxide (ZnO) is now often used as a transparent conductive oxide for contacts in thin-film silicon solar cells. This paper presents a study of ZnO material deposited by the low-pressure chemical vapour deposition technique, in a pressure range below th ...

2005

Metallo-organic low-pressure chemical vapor deposition of Ta2O5 using TaC12H30O5N as precursor for batch fabrication of microsystems

Nico de Rooij, Danick Briand, Peter Van der Wal

Ta2O5 thin films were produced by metallo-organic low pressure chemical vapor deposition using Tantalum(V) Tetraethoxydimethylaminoethoxide (TaC12H30O5N) as precursor. This liquid precursor at room temperature makes it possible to deposit thin films of Ta2 ...

2005

Study of radio-frequency plasma deposition of amorphous silicon for the improvement of solar cell production

Juliette Ballutaud

Plasma enhanced chemical vapour deposition (PECVD) of thin films such as amorphous silicon has widespread applications especially in the field of photovoltaic solar cells and thin-film transistors for flat screen production. Industrial applications require ...

EPFL2004

Effect of substrate crystalline morphology on the adhesion of plasma enhanced chemical vapor deposited thin silicon oxide coatings on polyamide

Yves Leterrier, John Christopher Plummer, Andrzej Kulik, Gil Rochat

The influence of the surface morphology of semicrystalline polyamide 12 PA12! on the adhesion of thin silicon oxide coatings is analyzed by means of uniaxial fragmentation tests and scanning local-acceleration microscopy SLAM!. Two types of PA12 substrates ...

2004

Structural properties and recombination processes in hydrogenated polymorphous silicon

Raphaël Butté

When silicon thin films are deposited by plasma enhanced chemical vapor deposition in a plasma regime close to powder formation, a new type of material, consisting of an amorphous matrix in which silicon nanocrystallites are embedded is obtained. This mate ...

2003

L'oxyde de zinc par dépôt chimique en phase vapeur comme contact électrique transparent et diffuseur de lumière pour les cellules solaires

Sylvie Faÿ

Zinc oxide (ZnO) is a material that belongs to the family of Transparent Conductives Oxides (TCO). Its non-toxicity and the abundant availability in the Earth's crust of its components make it an ideal candidate as electrical transparent contact for thin-f ...

EPFL2003

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