On the Powder Formation in the Plasma Enhanced Chemical Vapor Deposition Process for the Deposition of SiOx Barrier Coatings
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Capture numbers are used in models of nucleation and growth on surfaces, and have been widely applied to predict nucleation densities and other quantities via rate equations. In conventional nucleation theory, much effort has historically been expended on ...
Boron nitride films were deposited by r.f. capacitively-coupled plasma (13.56 MHz) using two different gas mixtures: Ar-B2H6-NH3 and Ar-B2H6-N-2. In order to study the gas-phase reactions of the plasma in situ Fourier transform infrared absorption spectros ...
Previous measurements of SixHm- anions and electrons in the afterglow of silane discharges are analyzed here. A model of plasma anion chemistry includes two sources of anions, two possible causes of x-->x+1 anion growth, and anion loss by mutual neutraliza ...
When silicon thin films are deposited by plasma enhanced chemical vapor deposition in a plasma regime close to the formation of powder, a new type of material, called hydrogenated polymorphous silicon (pm-Si:H) is obtained. This material has increased tran ...
The tribological behavior of carbon based thin films is strongly influenced by their chemical composition, polycrystalline structure and surface morphology. We present friction measurements on laser deposited amorphous carbon and carbon nitride (CNchi) thi ...
AIN is a material used in a wide variety of applications such as electroacoustic devices, blue diodes, IR windows, thermal conductors, metal-insulator-semiconductor structures, integrated circuit packaging, etc. In this work thin piezoelectric AIN polycrys ...
There is a need for chemically resistant coatings that protect the exposed surface of microfluidics components. Pinhole free films with low stress and a good uniformity on flat and inclined surfaces are required. In this study, amorphous silicon carbide (S ...
The energy redistribution processes in C60 trapped in low temp. rare gas solids have been studied using one- and two-color femtosecond pump-probe spectroscopy. The data show an ultrafast internal conversion process, followed by a slower electronic relaxati ...
Designing plasma-enhanced chemical vapour deposition (PECVD) reactors to coat large-area glass plates (similar to1 m(2)) for flat panel display or solar cell manufacturing raises challenging issues in physics and chemistry as well as mechanical, thermal, a ...
When silicon thin films are deposited by plasma enhanced chemical vapour deposition in a plasma regime close to that of the formation of powder, a new type of material, called polymorphous silicon (pm-Si), is obtained. We present here the optoelectronic an ...