Surface plasmon illumination scheme for contact lithography beyond the diffraction limit
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Nowadays, the use of micro- or nano-patterned surfaces is well established in wide fields of science and in numerous applications in the industry. Periodic surface-relief profiles with dimensions in the wavelength range of the light can act as diffractive ...
Institut de Microtechnique, Université de Neuchâtel2007
In this thesis various phenomena that appear if light interacts with objects having a size comparable to the wavelength are experimentally and theoretically analysed. The work is concentrated on the analysis of phase singularities in electromagnetic fields ...
Institut de Microtechnique, Université de Neuchâtel2004
The race to shrink feature sizes requires the limits of conventional lithography to be extended to high-throughput, low cost, reliable and well-controlled processes of which stencilling is a promising candidate for nanoscale applications. Identifying, pred ...
The excitation of a surface plasmon polariton (SPP) wave on a metal-air interface by a diffraction grating under monochromatic normal illumination is investigated numerically. The influence of the different experimental parameters (grating thickness, perio ...
The interplay between localized surface plasmon (LSP) and surface plasmon-polariton (SPP) is studied in detail in a system composed of a three-dimensional gold particle located at a short distance from a gold thin film. Important frequency shifts of the LS ...
We present results of the optical characterization of silicon photonic crystal waveguides and microcavities that are completely buried in a silicon dioxide cladding and are fabricated by deep ultraviolet (UV) lithography. The advantages of buried waveguide ...
We use rigorous diffraction theory to analyze the force on elliptical cylinders made from silver as a function of the elongation. We find that, when the wires are illuminated at the plasmon wavelength and placed in a highly focused Gaussian beam, they are ...
The endeavour to develop nanodevices demands for patterning methods in the nanometer scale. The continuous improvement in lithography methods based on deep UV (DUV), X-ray, or electron beam exposure allow for further progress in integrated circuit hardware ...
We present results of the optical characterization of silicon photonic crystal waveguides and microcavities that are completely buried in a silicon dioxide cladding and are fabricated by deep ultraviolet (UV) lithography. The advantages of buried waveguide ...
The creation of geometrically well-defined submicron structures on insulating substrates by e-beam lithography is hampered by surface charging. This problem becomes crucial when trying to create nanosized protein patterns by selective molecular assembly pa ...
