Optimization of thin film silicon solar cells on highly textured substrates
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During the last two decades, the Institute of Microtechnology (IMT) has contributed in two important fields to future thin-film silicon solar cell processing and design: (1) In 1987, IMT introduced the so-called "very high frequency glow discharge (VHF-GD) ...
Microcavity light-emitting diodes (MCLEDs) with top-emitting geometry have been grown by molecular beam epitaxy on GaAs and Si substrates. External quantum efficiencies of up to 10% were obtained for 420 x 420 mu m(2) homoepitaxial devices. The efficiency ...
The optical absorption coefficient of amorphous and microcrystalline silicon was determined in a spectral range 400-3100 nm and a temperature range 77-350 K. Transmittance measurement and Fourier transform photocurrent spectroscopy were used. The measured ...
Zinc oxide (ZnO) is a material that belongs to the family of Transparent Conductives Oxides (TCO). Its non-toxicity and the abundant availability in the Earth's crust of its components make it an ideal candidate as electrical transparent contact for thin-f ...
An enhanced optical absorption, compared to crystalline silicon, was observed in the above gap region together with very low defect-connected absorption in microcrystalline silicon (μc-Si:H) prepared by very high frequency glow discharge technique at 70 MH ...
In this work, a new type of short water vapor treatment of the interface between the p- and i-layer is presented. This novel treatment is performed under vacuum below 1 mbar for 5 min and considerably reduces the i-layer boron contamination in amorphous si ...
