Effect of deposition angle on the structure and properties of pulsed-DC magnetron sputtered TiAlN thin films
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A flexible method for simultaneous nanoscale structures fabrication and patterning is described, using a combination of stencil mask and pulsed-laser deposition (PLD) techniques. A miniature shadow-mask with nano-apertures in a very thin microfabricated me ...
Intermetallic thin films of stoichiometric NiAl and Ni3Al have been deposited onto n-type silicon (100) and nickel (110) substrates using r.f.-magnetron co-sputtering. The morphology and crystal structure of the thin films have been studied by transmission ...
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Electron Beam Induced Deposition (EBID) allows deposition of three-dimensional micro- and nano-structures of conductive and insulating materials on a wide range of substrates. The process is based on the decomposition of molecules of a pre-selected precurs ...
