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Ferroelectric thin films for memory and MEMS applications require noble metal or refractory metal oxide electrodes. In this paper, physical and chemical parameters during etching of RuO2 and Pr by a dual frequency ECR/RF reactor have been investigated. The ...
Platinum silicide films are widely used in silicon devices for ohmic and Schottky contacts. It has been demonstrated in the recent years that Schottky barriers employing ultra-thin platinum silicide films (thickness < 10 nm) are useful for photodetection i ...
This paper presents a microsystem consisting of an overhanging xy-microstage with integrated tip and comb actuators for scanning surface profiling. The design is optimized with respect to precise xy positioning at low drive voltages and accurate detection ...
We introduce two new low temperature bonding technologies for the assembly of microstructured glass substrates for the realisation of microchannels for miniaturised chemical analysis applications. A first method consists of a proper cleaning of the two gla ...
We have designed and realised a new type of microsystem for the electrical characterisation of arrays of living cells for biomedical diagnostic purposes. We have used deep plasma etching for the fabrication of microholes and micro-fluidic channels in silic ...
We report about a new process we have developed to fabricate miniaturized double layer octupoles that can be operated as electrostatic scanner/stigmators for charged particle beams. The fabrication process is based on deep reactive ion etching (DRIE) and a ...
