DRIE based novel technique for AFM probes fabrication
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An epitaxial 200 nm thick film of Pb(Zr0.40Ti0.60)O-3 (PZT) has been deposited by reactive rf magnetron sputtering on conductive Nb-doped SrTiO3 (100) (STO). The patterning process involved electron-beam lithography of polymethylmethacrylate, fabrication o ...
Epitaxial 50 nm and 200 nm thick films of Pb(Zr0.40Ti0.60)O-3 (PZT) have been deposited by reactive rf magnetron sputtering on conductive Nb-doped SrTiO3(100) (STO). The patterning process involved electron beam lithography of polymethylmethacrylate (PMMA) ...
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We report about a new process we have developed to fabricate miniaturized double layer octupoles that can be operated as electrostatic scanner/stigmators for charged particle beams. The fabrication process is based on deep reactive ion etching (DRIE) and a ...
Our recent developments concerning the fabrication of polymer microchips and their applications for biochemical analyses are reviewed. We first describe two methods of fabrication of polymer microfluidic chips, namely UV-laser photoablation and plasma etch ...
