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High vacuum chemical vapour deposition of oxides: A review of technique development and precursor selection

Publications associées (177)

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Atomic layer deposition (ALD) is one of the premier methods to synthesize ultra-thin materials on complex surfaces. The technique allows for precise control of the thickness down to single atomic layers, while at the same time providing uniform coverage ev ...

Hoboken2024

Colloidal Atomic Layer Deposition on Nanocrystals Using Ligand-Modified Precursors

Raffaella Buonsanti, Anna Loiudice, Krishna Kumar, Ona Segura Lecina, Petru Pasquale Albertini, Philippe Benjamin Green, Coline Marie Agathe Boulanger, Jari Leemans, Mark Adrian Newton

Atomic layer deposition (ALD) is a method to grow thin metal oxide layers on a variety of materials for applications spanning from electronics to catalysis. Extending ALD to colloidally stable nanocrystals promises to combine the benefits of thin metal oxi ...

Amer Chemical Soc2024

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To optimize material stability, automated high-throughput workflows are of increasing interest. However, many of those workflows either employ synthesis techniques not suitable for large-area depositions or are carried out in ambient conditions, which limi ...

Cambridge2024

Continuous development of thin film deposition technologies is essential for the fabrication of films that meet the specific requirements of their target applications and working conditions. Therefore, it is necessary to increase the number of accessible a ...

EPFL2023

Coating nano particles and other substrates for efficiency enhancement, protection and obtaining new atomic structures is a widespread research topic in catalysis and material synthesis. Thus far, different approaches of coating, ranging from simplest to s ...

EPFL2023

Application of a single metal or alloy is often restricted by its properties from optimal combination of performance and cost. Therefore, there is a vast need of joining dissimilar metals for various applications in biomedical, aerospace, automobile and ma ...

EPFL2023

The synthesis and stress characterization of metal thin-films deposited on silicon wafers were performed on this project. Two different deposition techniques were employed: magnetron sputtering and Atomic Layer Deposition (ALD). Moreover, different tests w ...

2022

Colloidal transport and deposition through dense vegetation

David Andrew Barry, Li Chen, Congrong Yu

The effectiveness of submerged synthetic aquatic vegetation on removal of colloids from flowing water was investigated to explore retention of particulate nonpoint source pollutants in aquatic systems. In colloid transport experiments, the deposition rate ...

2022

Vapor Transport Deposition of Methylammonium Iodide for Perovskite Solar Cells

Christophe Ballif, Quentin Thomas Jeangros, Florent Sahli, Cédric Bucher, Aymeric Michel Schafflützel, Björn Niesen, Léo Duchêne, Quentin Jean-Marie Armand Guesnay, Niccolo Salsi, Nathanaël Miaz

Vapor-based processes are promising options to deposit metal halide perovskite solar cells in an industrial environment due to their ability to deposit uniform layers over large areas in a controlled environment without resorting to the use of (possibly to ...

2021

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Vapor-based processes are particularly promising to deposit the perovskite thin film absorber of solar cells. These deposition methods are up-scalable, involve a controlled solvent-free environment, have the ability to conformally coat rough substrates, in ...

2021