The surface morphology of MnSi thin films grown on Si(111)-7 x 7 substrates was investigated by systematically changing the amount of deposited Mn. A new 3 x 3 surface reconstruction was found at the very initial growth stages, whose atomic configuration was analyzed both experimentally and theoretically. At a coverage of 0.1 monolayers, the formation of nanometer-sized MnSi islands was observed in coexistence with Mn nanoclusters that fit within the 7 x 7 half unit cell. With increasing Mn deposition, the MnSi islands grow, develop extended flat tops and eventually coalesce into an atomically flat film with a high corrugated root 3x root 3 reconstruction punctuated by several holes. The successive film growth mode is characterized by the formation of MnSi quadlayers with a low corrugated root 3x root 3 reconstruction. (C) 2013 Elsevier B.V. All rights reserved.
David Lyndon Emsley, Ümmügülsüm Günes, Michael Allan Hope, Manuel Cordova, Aditya Mishra
Quentin Jean-Marie Armand Guesnay
Kevin Sivula, Jun Ho Yum, Marina Caroline Michèle Caretti, Benjamin Goldman, Rebekah Anne Wells, Simon Nussbaum, Loï Charles Carbone, Linda Lazouni, Emeline Cécile Rideau, Elizaveta Potapova Mensi, Hannah Elizabeth Johnson