Role of stress in the chemical etching of fused silica exposed to low-energy femtosecond laser pulses
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We demonstrate the capabilities of a new optical microelectromechanical systems device that we specifically developed for broadband femtosecond pulse shaping. It consists of a one-dimensional array of 100 independently addressable, high-aspect-ratio microm ...
Femtosecond laser irradiation has various noticeable effects on fused silica. Of particular interest, pulses with energy levels below the ablation threshold can locally increase the refractive index and the material etching selectivity to hydrofluoric acid ...
Femtosecond laser pulses used in a regime below the ablation threshold have two noticeable effects on Fused Silica (a-SiO2): they locally increase the material refractive index and modify its HF etching selectivity. The nature of the structural changes ind ...
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