Hot electron emission array for e-beam photolithography and display screens
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The endeavour to develop nanodevices demands for patterning methods in the nanometer scale. The continuous improvement in lithography methods based on deep UV (DUV), X-ray, or electron beam exposure allow for further progress in integrated circuit hardware ...
Sub-micron lithography processes are continuously optimized for semiconductor products where the enormous market potential justifies investment in advanced methods and extremely sophisticated equipment. Due to the extreme process costs and due to the limit ...
NOVELTY - The electronic display (2) includes a number of cells (12) whose upper faces form a display surface, each cell has an electro-optic display unit (6) with inputs (14) for data to be displayed. A programmable logic circuit (20) is associated with f ...
Method and apparatus enabling color or black/white bi-level or multi-level halftone images to be displayed or printed on various raster output devices, in particular on display devices (cathode ray tubes, plasma displays, liquid crystal displays) or on pri ...
We present some typical applications of our device simulation model "MOLED" which has proven to be a very useful tool for obtaining insight into the functioning of multi-layer organic light-emitting devices (OLED's). Our general approach consists of combin ...
Screen printed electrochromic reflective displays, based on nanocryst. metal-oxide working electrodes derivatized with org. electrochromophores, have been developed. Segmented devices up to the size of 200 cm2, primarily designed for information sign appli ...