Explaining Morphological and Electrical Features of Boron-doped Zinc Oxide to Tailor New Electrodes for Photovoltaics
Publications associées (309)
Graph Chatbot
Chattez avec Graph Search
Posez n’importe quelle question sur les cours, conférences, exercices, recherches, actualités, etc. de l’EPFL ou essayez les exemples de questions ci-dessous.
AVERTISSEMENT : Le chatbot Graph n'est pas programmé pour fournir des réponses explicites ou catégoriques à vos questions. Il transforme plutôt vos questions en demandes API qui sont distribuées aux différents services informatiques officiellement administrés par l'EPFL. Son but est uniquement de collecter et de recommander des références pertinentes à des contenus que vous pouvez explorer pour vous aider à répondre à vos questions.
Capture numbers are used in models of nucleation and growth on surfaces, and have been widely applied to predict nucleation densities and other quantities via rate equations. In conventional nucleation theory, much effort has historically been expended on ...
A combined PVD/PECVD process for the vacuum deposition of titaniumcontainingamorphoushydrogenatedcarbonfilms is described. Elemental compositions of the deposited films have been determined by in situ core level photoelectron spectroscopy (XPS). The long-t ...
Nanocryst. TiO2-based films with a special penniform microstructure were prepd. by reactive d.c. magnetron sputtering followed by dye sensitization. The films were integrated in a solar cell configuration and were able to yield a higher photocurrent than s ...
When silicon thin films are deposited by plasma enhanced chemical vapor deposition in a plasma regime close to the formation of powder, a new type of material, called hydrogenated polymorphous silicon (pm-Si:H) is obtained. This material has increased tran ...
The tribological behavior of carbon based thin films is strongly influenced by their chemical composition, polycrystalline structure and surface morphology. We present friction measurements on laser deposited amorphous carbon and carbon nitride (CNchi) thi ...
Intermetallic thin films of stoichiometric NiAl and Ni3Al have been deposited onto n-type silicon (100) and nickel (110) substrates using r.f.-magnetron co-sputtering. The morphology and crystal structure of the thin films have been studied by transmission ...
Designing plasma-enhanced chemical vapour deposition (PECVD) reactors to coat large-area glass plates (similar to1 m(2)) for flat panel display or solar cell manufacturing raises challenging issues in physics and chemistry as well as mechanical, thermal, a ...
Polymeric precursor solution (Pechini method) was used to deposit LiNbO3 thin films by spin-coating on (100) silicon substrates. X-ray diffraction data of thin films showed that the increase of oxygen flow promotes a preferred orientation of (001) LiNbO3 p ...
Nanocryst. solar cells were made by incorporation of cis-dithiocyanato-bis(2,2'-bipyridyl-4,4'-dicarboxylate) ruthenium (II) into sputter deposited titanium oxide films. After a pyridine treatment, it was possible to achieve a photoelec. conversion efficie ...
We investigate the hydrogen related bonding structure in hydrogenated polymorphous silicon films (pm-Si:H) and hydrogenated microcrystalline silicon. Infra-red spectra reveal some new features for both kinds of films. namely new modes appearing in the stre ...