Atomic layer deposition of TiO2 for stabilization of Pt nanoparticle oxygen reduction reaction catalysts
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Atomic layer deposition (ALD) is one of the premier methods to synthesize ultra-thin materials on complex surfaces. The technique allows for precise control of the thickness down to single atomic layers, while at the same time providing uniform coverage ev ...
Continuous development of thin film deposition technologies is essential for the fabrication of films that meet the specific requirements of their target applications and working conditions. Therefore, it is necessary to increase the number of accessible a ...
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The aim of this project is to deposit a thin film of aluminum nitride (AlN) or aluminum scandium nitride (AlScN) on a quartz substrate showing good piezoelectric properties for use in tuning fork oscillators. Quartz oscillators are commonly used in various ...
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