Publications associées à Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Fabrication of sub-10 nm gap arrays over large areas for plasmonic sensors

We report a high-throughput method for the fabrication of metallic nanogap arrays with high-accuracy over large areas. This method, based on shadow evaporation and interference lithography, achieves sub-10 nm gap sizes with a high accuracy of 61.5 nm. Cont ...

American Institute of Physics2011

Photosensitivity and stress changes of Ge-free Bi-Al doped silica optical fibers under ArF excimer laser irradiation

Hans Georg Limberger, Christian Ban

The photosensitivity of germanium free Bi-Al-doped silica fibers with different bismuth concentrations was investigated using ArF excimer laser radiation at 193 nm and fiber grating formation. For the fiber with the highest bismuth concentration maximum re ...

Optical Society of America2011

Angular Dependence of Magnetic Normal Modes in NiFe Antidot Lattices With Different Lattice Symmetry

Dirk Grundler

We report an experimental investigation of the magnetic normal modes in large-area Ni80Fe20 antidot arrays fabricated on commercially available silicon substrates using deep ultraviolet lithography at 248 nm exposing wavelength. The effect of the lattice s ...

Institute of Electrical and Electronics Engineers2010

Electron-beam induced photoresist shrinkage influence on 2D profiles

Vasiliki Tileli

For many years, lithographic resolution has been the main obstacle in keeping the pace of transistor densification to meet Moore's Law. For the 32 nm node and beyond, new lithography techniques will be used, including immersion ArF (iArF) lithography and e ...

International Society for Optics and Photonics2010

Stencil assisted reactive ion etching for micro and nano patterning

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Stencil-assisted oxygen reactive ion etching is a low-cost and parallel process for the replication of micrometric and nanometric patterns in any organic material. This lithography process allows the patterning of organic material non sensitive to electron ...

2008

Configurable slit-mask unit of the Multi-Object Spectrometer for Infra-Red Exploration for the Keck telescope : Integration and Tests

Simon Nessim Henein, Philippe Schwab

A Configurable Slit Unit (CSU) has been developed for the Multi-Object Spectrometer for Infra-Red Exploration (MOSFIRE) instrument to be installed on the Keck 1 Telescope on Mauna Kea, Hawaii. MOSFIRE will provide NIR multi-object spectroscopy over a field ...

Society of Photo-Optical Instrumentation Engineers (SPIE)2008

Predicting mask distortion, clogging and pattern transfer for stencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

One of the ultimate tasks for stencil lithography is the ability to fabricate arrays of structures with controlled dimensions on the nanometer scale precisely positioned on a suitable surface. The race to shrink feature sizes requires the limits of convent ...

2007

Nanostencil Lithography - Quick & Clean: Towards a reliable scalable nanopatterning method

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Nao Takano

Stencil lithography is a surface patterning technique that relies on the local deposition of material through miniaturized shadow mask membranes. This method has been used since many years in various implementations for the formation of patterns, mainly st ...

2006

Modelling pattern transfer in stencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

The race to shrink feature sizes requires the limits of conventional lithography to be extended to high-throughput, low cost, reliable and well-controlled processes of which stencilling is a promising candidate for nanoscale applications. Identifying, pred ...

2006

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Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Fabrication of sub-10 nm gap arrays over large areas for plasmonic sensors

Photosensitivity and stress changes of Ge-free Bi-Al doped silica optical fibers under ArF excimer laser irradiation

Angular Dependence of Magnetic Normal Modes in NiFe Antidot Lattices With Different Lattice Symmetry

Electron-beam induced photoresist shrinkage influence on 2D profiles

Biomolecule Patterning on Analytical Devices: A Microfabrication-Compatible Approach

Stencil assisted reactive ion etching for micro and nano patterning

Configurable slit-mask unit of the Multi-Object Spectrometer for Infra-Red Exploration for the Keck telescope : Integration and Tests

Predicting mask distortion, clogging and pattern transfer for stencil lithography

Nanostencil Lithography - Quick & Clean: Towards a reliable scalable nanopatterning method

Modelling pattern transfer in stencil lithography

Graph Chatbot

Chattez avec Graph Search

Electron-beam induced photoresist shrinkage influence on 2D profiles

Stencil assisted reactive ion etching for micro and nano patterning

Predicting mask distortion, clogging and pattern transfer for stencil lithography

Modelling pattern transfer in stencil lithography

Fabrication of sub-10 nm gap arrays over large areas for plasmonic sensors

Angular Dependence of Magnetic Normal Modes in NiFe Antidot Lattices With Different Lattice Symmetry

Photosensitivity and stress changes of Ge-free Bi-Al doped silica optical fibers under ArF excimer laser irradiation

Configurable slit-mask unit of the Multi-Object Spectrometer for Infra-Red Exploration for the Keck telescope : Integration and Tests

Biomolecule Patterning on Analytical Devices: A Microfabrication-Compatible Approach

Nanostencil Lithography - Quick & Clean: Towards a reliable scalable nanopatterning method