Low resistivity Ru1-xTixO2 thin films deposited by hybrid high-power impulse magnetron sputtering and direct current magnetron sputtering technique

The present paper reports on an experimental investigation of the structural, electrical and optical properties of Ru rich Ru1-xTixO2 thin films. Rutile single-phaseRu(1-x)Ti(x)O(2) thin films have been deposited by reactive hybrid High-power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) at a substrate temperature of 250 degrees C. The HiPIMS source was applied to the Ru target while the DCMS source was connected to the Ti target in order to vary the Ti content in the films. The films are well crystallized and compact with randomly orientated nanocrystallites. The optical properties have been investigated by ellipsometric measurements in the optical energy range from 1.3 eV to 3.3 eV, while the electrical resistivity has been measured in the Van der Paw configuration at room temperature. The electrical resistivity increases gradually from 70 mu Omega cm for pure RuO2 to about 243 mu Omega cm for Ru1-xTixO2 films with x = 0.13. The optical properties are correlated with the Ti doping. The refractive index n changes from a strong dispersion relationship to a moderate one with increasing Ti content.

WC/a-C nanocomposite thin films: Optical and electrical properties

Rosendo Sanjines

WC/amorphous carbon (a-C) thin films were deposited by dual magnetron sputtering from individual WC and graphite targets. The influence of film composition and microstructure on the optical and electrical properties was investigated. As evidenced by x-ray photoelectron spectroscopy and grazing angle x-ray diffraction measurements, the WC/a-C films are composite materials made of hexagonal W2C and/or cubic beta-WC1-X nanocrystallites embedded in (a-C) matrix. The optical properties were studied by spectroscopic ellipsometry and the electrical resistivity was measured by the van der Pauw method between 20 and 300 K. Both the optical and the electrical properties of the WC/a-C films are correlated with the chemical composition and microstructure evolution caused by a-C addition. The optical properties of W2C/a-C and beta-WC1-x/a-C films with a-C content

2009

Identification of Ternary Phases in TiBC/a-C Nanocomposite Thin Films: Influence on the Electrical and Optical Properties

Rosendo Sanjines

The local structure of TiBC and amorphous carbon (a-C) nanocomposite films (TiBC/a-C) was correlated with their optical and electrical properties. TiBC/a-C films with increasing C content were deposited by magnetron co-sputtering from TiC:TiB2 (60: 40) and graphite targets. Chemical composition is determined by electron energy-loss spectroscopy. Grazing incidence X-ray diffraction reveals that the microstructure of the films is amorphous with small nanocrystallites emerging by increasing the C content that could be attributed to the formation of ternary (TiBxCy) or mixed binary (TiB2 and TiC) phases. Further information was then obtained by studying the chemical bonding by measuring the near-edge fine structure (NES) by electron energy-loss (B K-, C K-, and Ti L-edges) and X-ray absorption (B K-and Ti L-edges) spectroscopies. The NES analysis indicates the formation of a nanocrystalline ternary TiBxCy compound concomitant with the segregation of an a-C phase as the carbon content is increased. The optical properties were studied by spectroscopic ellipsometry and the electrical resistivity was measured by the Van der Pauw method between 20 and 300 K. The films continuously lose their metallic character in terms of optical constants and resistivity with increasing carbon content. Theoretical fitting of the electrical properties using the grain-boundary scattering model supported the formation of a nanocomposite structure based on a ternary TiBxCy phase embedded in a matrix of a-C. The electron transport properties are mainly limited by the high density of point defects, grain size, and transmission probability.

2011

Electrical and optical properties of Ta-Si-N thin films deposited by reactive magnetron sputtering

David Oezer, Rosendo Sanjines

The electrical and optical properties of TaxSiyNz thin films deposited by reactive magnetron sputtering from individual Ta and Si targets were studied in order to investigate the effects of nitrogen and silicon contents on both properties and their correlation to the film microstructure. Three sets of fcc-TaxSiyNz thin films were prepared: sub-stoichiometric TaxSiyN0.44, nearly stoichiometric TaxSiyN0.5, and over-stoichiometric TaxSiyN0.56. The optical properties were investigated by near-normal-incidence reflectivity and ellipsometric measurements in the optical energy range from 0.375 eV to 6.8 eV, while the d.c. electrical resistivity was measured in the van der Pauw configuration from 20 K to 300 K. The optical and electrical measurements were interpreted using the standard Drude-Lorentz model and the so-called grain boundary scattering model, respectively. The electronic properties were closely correlated with the compositional and structural modifications of the TaxSiyNz films due to variations in the stoichiometry of the fcc-TaNz system and the addition of Si atoms. According to the nitrogen and silicon contents, fcc-TaxSiyNz films can exhibit room temperature resistivity values ranging from 10(2) mu Omega cm to about 6 x 10(4) mu Omega cm. The interpretation of the experimental temperature-dependent resistivity data within the Grain Boundary Scattering model, combined with the results from optical investigations, showed that the mean electron transmission probability G and the free carriers concentration, N, are the main parameters that control the transport properties of these films. The results indicated that the correlation between electrical and optical measurements with the chemical composition and the nanostructure of the TaxSiyNz thin films provides a pertinent and consistent description of the evolution of the Ta-Si-N system from a solid solution to a nanocomposite material due to the addition of Si atoms. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4766904]

Amer Inst Physics2012

Electrical and optical properties of Ta-Si-N thin films deposited by reactive magnetron sputtering

David Oezer, Rosendo Sanjines

Amer Inst Physics2012