Silicon Corrosion in Neutral Media: The Influence of Confined Geometries and Crevice Corrosion in Simulated Physiological Solutions

Silicon (Si) based implantable components are widely used to restore functionalities in the human body. However, there have been reported instances of Si corroding after only a few years of implantation. A key parameter often overlooked when assessing Si stability in-vitro, is the added constricting geometries introduced through in-vivo implantation. The influence of crevices and confined solutions on the stability of Si is presented in this study, considering two simulated physiological solutions: 0.01 M phosphate buffered saline (PBS) and HyClone Wear Test Fluid (WTF). It was found that Si is highly vulnerable to corrosion in confined/crevice conditions. High pitting corrosion susceptibility is found in a crevice, whereas a dissolution rate of ca. 3.6 nm/h at body temperature occurred due to local alkalization within a confined cathodic area. The corrosion rates could be increased by elevating the temperature and yielded linear Arrhenius relations, with activation energies of 106 KJ/mol in 0.01MPBS and 109 KJ/mol in HyClone WTF, corresponding to a phosphorous-silicon interaction mechanism. Phosphorous species favored corrosion and contributed to enhanced Si dissolution, while chlorides were not so influential, and applied anodic potential induced pseudo-passivation. These results highlight the importance geometrical configurations can have on a material's surface stability. (c) The Author(s) 2019. Published by ECS. This is an open access article distributed under the terms of the Creative Commons Attribution 4.0 License (CC BY, http://creativecommons.org/licenses/by/4.0/), which permits unrestricted reuse of the work in any medium, provided the original work is properly cited.