Plasma sputtering of biased electrodes in an oblique magnetic field

The surface erosion of biased electrodes immersed in a radio frequency (RF) plasma was investigated in oblique magnetic fields ranging from 0.1 T to 3.5 T. The plasma potential and density in the vicinity of the biased electrode have been measured using an RF-compensated cylindrical Langmuir probe moved by a three-dimensional motorised arm in the ALINE facility at 0.1 T. The erosion profiles were determined for different gases (argon and helium), magnetic field strength and plasma volume for the same electrode surface area at an angle of 5(degrees) with the magnetic field in three different experimental geometries. The radial electric field (perpendicular to the magnetic field) in the plasma column has been deduced from plasma potential measurements. This radial field makes the ions converge to the core of the plasma column at grazing angles (< 30(degrees)) and is reversed at larger angles. The ion flux on the sample increases with the magnetic field magnitude leading to a strong erosion inhomogeneity. At lower plasma volume, the erosion rate is sensitively enhanced. Local redeposition was identified using x-ray photoelectron spectroscopy on the surfaces exhibiting preferential deposition directions. Finally, the asymmetric erosion patterns obtained from a molybdenum layer etching are explained by the similar asymmetric density maps obtained with the probe and by the E--> x B--> drift and the local sheath acceleration.