Etude par STM de la déposition d'agrégats d'or sur TiO2 et mesure de l'émission électronique secondaire induite par l'impact d'agrégats sur une surface
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Focused Electron Beam Induced Deposition (FEBID) is a rapid prototyping technique for the investigation, production and modification of 2 and 3-D nanostructures. The process takes place at room temperature, in the high-vacuum chamber of a Scanning Electron ...
The vacuum deposition of complex functional molecules and nanoparticles by thermal sublimation is often hindered due to their extremely low vapor pressure. This especially impedes the application of ultrahigh vacuum (UHV) based analytical and surface modif ...
Beams of electrons and ions are now fairly routinely focused to dimensions in the nanometer range. Since the beams can be used to locally alter material at the point where they are incident on a surface, they represent direct nanofabrication tools. The aut ...
The addition of carbon to samples, during transmission electron microscope imaging, presents a barrier to accurate analysis; the controlled deposition of hydrocarbons by a focused electron beam can be a useful technique for local nanometer-scale sculpting ...
Combinatorial lithium niobate deposition on 150 mm naturally oxidized silicon (100) wafers in a high-vacuum chemical vapor deposition reactor using Li(OBut) and Nb(OEt)4(dmae) is presented. The novel precursor supply system allows individual spatial contro ...
Generation of a swing electron cyclotron current drive (swing ECCD), i.e. driving alternated, symmetric, positive or negative local ECCD, during a single discharge and at constant total input EC power, was performed at the Tokamak a Configuration Variable ...
Starting from the quantum-Boltzmann equation derived in a previous paper, we study the irreversible evolution of an electron gas in the one-particle phase space. The connection with phase space is established by expressing one-electron states in terms of t ...
The growth dynamics of oxygen assisted focused electron beam induced deposition of Si-containing materials (from SiOxCy to SiO2) were investigated as a function of relevant process parameters. The results obtained from organosilanes of different families ( ...
Hafnium tetrachloride is one of the most commonly used precursors for atomic layer deposition of HfO2. According to the experimental result, chlorine residue is almost unavoidably incorporated during the deposition process. We performed first-principles ca ...
This contribution summarizes a number of aspects of the experimental and modelling programme at JET aimed at improving the characterization and understanding of edge localized mode (ELM) transport in the scrape-off layer (SOL). Divertor target energy depos ...