Publication
Silicon microneedle electrode array with temperature monitoring for electroporation
Publications associées (36)
Copper / low-k technological platform for the fabrication of high quality factor above-IC passive devices
Modern communication devices demand challenging specifications in terms of miniaturization, performance, power consumption and cost. Every new generation of radio frequency integrated circuits (RF-ICs) offer better functionality at reduced size, power cons ...
EPFL2007Fabrication of silicon nano wires and gate-all-around MOS devices
Didier Bouvet, Kirsten Emilie Moselund
The invention relates to methods for manufacturing semiconductor devices. Processes are disclosed for implementing suspended single crystal silicon nano wires (NWs) using a combination of anisotropic and isotropic etches and spacer creation for sidewall pr ...
2007Novel full platinum nanoprobes suitable for biological SPM experiments
Jürgen Brugger, Johannes Steen
We have developed a hybrid scanning probe microscopy sensor consisting of a SU-8 body and full platinum cantilever and tip. The fabrication process is based on surface-micromachining of a silicon wafer, where oxidation sharpened moulds define the tip shape ...
2006Micro-Four-Point probe based on SU-8 cantilevers
The four-point probe is used for the measurement of the resistivity of thin metal or semiconductor films. There is an interest in miniaturization of the probes to obtain higher surface sensitivity, an increased spatial resolution and less damage to the sam ...
2005