EVAPORATION THROUGH SHADOW MASKS ON UNCONVENTIONAL SUBSTRATES
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A tool and method for flexible and rapid surface patterning technique beyond lithography based on high-resolution shadow mask method, or nanostencil, is presented. This new type of miniaturized shadow mask is fabricated by a combination of MEMS processes a ...
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We compare three different approaches to high-resolution contact lithography with special emphasis on contrast mechanisms for subwavelength structures. Masks with protruding metal absorbers, masks with absorbers embedded in the transparent background, and ...
A new tool of surface patterning technique for general purpose lithography was developed based on shadow mask method. This paper describes the fabrication of a new type of miniaturized shadow mask. The shadow mask is fabricated by photolithography and etch ...
On-site distributed measurements using a sensor based on stimulated Brillouin scattering are presented. Long fibre length can be used, so that a dense 2D or 3D measurement of strain or temperature can be obtained in large structure. ...
Society of Photo-Optical Instrumentation Engineers1999
