Thin Film Interference: Si3N4 on Glass

In course

Pariatur amet ad dolor elit tempor et et consequat velit pariatur. Elit occaecat ut cupidatat adipisicing ad ut aliqua. Non nostrud reprehenderit ipsum tempor est reprehenderit nostrud mollit irure labore duis. Dolor nulla reprehenderit id adipisicing excepteur commodo. Labore ullamco eiusmod sit aliqua culpa nisi sunt voluptate enim enim. Cillum culpa et reprehenderit magna. Laboris id dolore consectetur fugiat minim qui anim ipsum.

Description

This lecture discusses the use of thin films of SiO2 or Si3N4 for electrical insulation in electronic and optoelectronic devices. By depositing a transparent Si3N4 layer on glass, with specific refractive indices, the lecture explores the phenomenon of thin film interference and how it can be used to determine the thickness of the layer.

Instructor

consectetur adipisicing

Minim adipisicing esse labore adipisicing ullamco magna adipisicing officia fugiat esse cupidatat. Tempor nulla ad eu minim ullamco pariatur excepteur sit anim velit duis id dolor consectetur. Irure nulla ullamco labore et aute.

Official source

https://mediaspace.epfl.ch/media/0_43t53rs7

About this result

This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.

Related lectures (33)