Lecture

Ion Beam Etching

Description

This lecture introduces ion beam etchers, which use a beam of ions to etch substrates without plasma, allowing for control of ion flux and neutral flux. The technique combines physical sputtering with chemical activity, offering special possibilities in microfabrication and fundamental studies of dry etching.

About this result
This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.