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Lecture
Fabrication Technology
Description
This lecture covers the process integration in semiconductor fabrication, including the twin-well process, isolation methods like LOCOS and STI, threshold voltage adjustment, poly gate formation, LDD extension implant, source/drain formation, and back-end-of-line processes. It also discusses the formation of silicide, types of silicides, and their importance in modern deep-submicron processes like the damascene and dual-damascene copper processes.
Official source
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