Radiation material scienceRadiation materials science is a subfield of materials science which studies the interaction of radiation with matter: a broad subject covering many forms of irradiation and of matter. Some of the most profound effects of irradiation on materials occur in the core of nuclear power reactors where atoms comprising the structural components are displaced numerous times over the course of their engineering lifetimes.
Interatomic potentialInteratomic potentials are mathematical functions to calculate the potential energy of a system of atoms with given positions in space. Interatomic potentials are widely used as the physical basis of molecular mechanics and molecular dynamics simulations in computational chemistry, computational physics and computational materials science to explain and predict materials properties.
Collision cascadeIn condensed-matter physics, a collision cascade (also known as a displacement cascade or a displacement spike) is a set of nearby adjacent energetic (much higher than ordinary thermal energies) collisions of atoms induced by an energetic particle in a solid or liquid. If the maximum atom or ion energies in a collision cascade are higher than the threshold displacement energy of the material (tens of eVs or more), the collisions can permanently displace atoms from their lattice sites and produce defects.
Stopping power (particle radiation)In nuclear and materials physics, stopping power is the retarding force acting on charged particles, typically alpha and beta particles, due to interaction with matter, resulting in loss of particle kinetic energy. Its application is important in areas such as radiation protection, ion implantation and nuclear medicine. Both charged and uncharged particles lose energy while passing through matter. Positive ions are considered in most cases below. The stopping power depends on the type and energy of the radiation and on the properties of the material it passes.
Ion implantationIon implantation is a low-temperature process by which ions of one element are accelerated into a solid target, thereby changing the physical, chemical, or electrical properties of the target. Ion implantation is used in semiconductor device fabrication and in metal finishing, as well as in materials science research. The ions can alter the elemental composition of the target (if the ions differ in composition from the target) if they stop and remain in the target.
