Concept
Semiconductor package
Related people (21)
Paul Muralt
Paul Muralt received a diploma in experimental physics in 1978 at the Swiss Federal Institute of Technology ETH in Zurich. He accomplished his Ph.D. thesis in the field of commensurate-incommensurate phase transitions at the Solid State Laboratory of ETH. In the years 1984 and 1985 he held a post doctoral position at the IBM Research Laboratory in Zurich where he pioneered the application of scanning tunneling microscopy to surface potential imaging. In 1987, after a stay at the Free University of Berlin, he joined the Balzers group in Liechtenstein. He specialized in sputter deposition techniques, and managed since 1991 a department for development and applications of Physical Vapor Deposition and PECVD processes. In 1993, he joined the Ceramics Laboratory of EPFL in Lausanne. AS group leader for thin films and MEMS devices, he specialized in piezoelectric and pyroelectric MEMS with mostly Pb(Zr,Ti)O3 and AlN thin film. His research interests are in thin film growth in general, and more specifically in property assessment of small ferroelectric structures, in integration issues of ferroelectric and other polar materials, property-microstructure relationships, and applications of polar materials in semiconductor and micro-electro-mechanical devices. More recently he extended his interests to oxide thin films of ionic conductors. The focus in piezoelectric thin films was directed towards AlN-ScN alloys. He gives lectures in thin film processing, micro fabrication, and surface analysis. He authored or co-authored more than 230 scientific articles. He became Fellow of IEEE in 2013. In 2005, he received an outstanding achievement award at the International Symposium on Integrated Ferroelectrics (ISIF), and in 2016 the B.C. Sawyer Memorial award.
Chairman of the International Workshops on Piezoelectric MEMS(http://www.piezomems2011.org/)
Cyrille Hibert
Cyrille HIBERT received his diploma in Physics in 1994 and his PhD in 1998 from University of Orleans (FR). He then held a post doctoral position in GREMI laboratory at the University of Orleans in collaboration with Alcatel Vacuum Technology and ST Microelectronics, working in deep anisotropic etching of silicon with an Inductively Coupled Plasma reactor. In May 2000 he joined the EPFL-Center of Micro-Nano-technology where he was in charge of the plasma etching activities. He left EPFL in October 2003 for a sabbatical year to join the CFF group at NMRC (Ireland) now called Tyndall Institute. He worked on developing plasma processing. In October 2004, he came back to EPFL-CMI to be in charge of etching and nanotechnology activities (FIB and future ebeam litho).