Concept

Etching

Related publications (41)

Reversing the shape transition of InAs/GaAs (001) quantum dots by etching-induced lateral In segregation

Klaus Kern, Theresa Lutz, Giovanni Costantini

The shape evolution of epitaxially grown InAs/GaAs(001) quantum dots after the controlled removal of material by an in situ etching gas is investigated by atomic force and scanning tunneling microscopy. The presence of {137} facets on the surface of partia ...

2010

Physicochemical and Electrochemical Properties of Etched GaP(111)A and GaP(111)B Surfaces

Blake William Erickson

The observable chemical, electrochemical, and morphological features of GaP(111) surfaces after wet chemical etching have been assessed using X-ray photoelectron spectroscopy, atomic force microscopy, and electrochemical impedance spectroscopy. HF(aq), NH4 ...

2010

Design and characterization of low aspectratio nanopore arrays

Laurent Coulot

Alumina nanopores seem to be very promising concerning many applications, such as DNA analysis 1‐2, separation of molecules 3‐4 or fabrication of nanopillars 5‐6. The nanopores are made by anodization, which is a really simple fabrication process requiring ...

2010

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Kristopher Pataky

Resistless processes to realize the pattern transfer of your designs into the substrate present some advantages, as the reduction in fabrication steps. Stencil Lithography (SL) is one of the most used resistless processes and, up to now, it has mainly been ...

2008

Fluorine based plasma treatment of biocompatible silicone elastomer. Effect of temperature on etch rate and surface properties

Arnaud Bertsch, Cyrille Hibert

This paper describes F-based dry etching and resulting surface properties of biocompatible silicone elastomer. The etch rate of polysiloxane and surface morphology was found to be highly temperature dependent. An increase in temperature results in a signif ...

2008

Characterization of the feature-size dependence in Ar/Cl2 chemically assisted ion beam etching of InP-based photonic crystal devices

Romuald Houdré, Rolando Ferrini

The authors address feature-size dependence in Ar/Cl2 chemically assisted ion beam etching (CAIBE) in the context of the fabrication of photonic crystal (PhC) structures. They systematically investigate the influence of various parameters such a ...

2007

Développement et étude d'une technique de microsablage à haute résolution

Anne-Gabrielle Pawlowski

We have used powder blasting as a technique to structure brittle materials like glass using an erosion resistant mask. The study of the erosion rate shows that the erosion of glass is maximum at a normal incidence of the powder beam while the erosion rate ...

EPFL2006

Stenci Lithography: Status and Prospectives

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Nao Takano

Stencil lithography is a surface patterning technique that relies on the local deposition of material through miniaturized shadow mask membranes. This method has been used since many years in various implementations for the formation of patterns (mainly st ...

2006

Polymer-based cantilevers with integrated electrodes

Jürgen Brugger, Giovanni Boero, Radivoje Popovic, Schahrazede-Lila Mouaziz

An innovative release method of polymer cantilevers with embedded integrated metal electrodes is presented. The fabrication is based on the lithographic patterning of the electrode layout on a wafer surface, covered by two layers of SU-8 polymer: a 10-um-t ...

Institute of Electrical and Electronics Engineers2006

STAMP FABRICATION FOR NANOIMPRINT LITHOGRAPHY BY PATTERN DEFINITION WITH STENCIL LITHOGRAPHY

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Nao Takano

A silicon stamp for nanoimprint lithography (NIL) was fabricated from the patterns defined by stencil lithography. Since stencil lithography has a capability of producing sub-micron patterns in a single process, we were able to make a silicon stamp with a ...

2006

Graph Chatbot

Chat with Graph Search

Ask any question about EPFL courses, lectures, exercises, research, news, etc. or try the example questions below.

DISCLAIMER: The Graph Chatbot is not programmed to provide explicit or categorical answers to your questions. Rather, it transforms your questions into API requests that are distributed across the various IT services officially administered by EPFL. Its purpose is solely to collect and recommend relevant references to content that you can explore to help you answer your questions.