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We present the successful fabrication of horizontally grown and dense carbon nanotube (CNT) membranes in situ. A TiN/Al2O3/TiN stack is first patterned to be employed as a support for the CNT growth. Iron is then evaporated with a 45 degrees tilt angle on ...
We propose to use digital holographic microscopy (DHM) with an illumination in the near infrared spectrum bandwidth, where the silicon is known to have small absorption. With such an illumination condition, it is possible to observe a wider range of specim ...
Neural networks (NNs) implemented at the transistor level are powerful adaptive systems. They can perform hundreds of operations in parallel but at the expense of a large number of building blocks. In the case of analog realization, an extremely low chip a ...
Institute of Electrical and Electronics Engineers2011
A large area array of metal-oxide-metal (MOM) tunneling diodes with an ultrathin dielectric (∼3.6 nm aluminum oxide) have been fabricated via a transfer-printing process. The MOM diodes exhibit an excellent tunneling behavior that is suitable for rectifyin ...
This paper presents a new hybrid circuit breaker topology based on the use of serial and parallel semiconductors that allows to increase the supply voltage and default current with no arc, and to benefit from a current limitation function. A concrete marin ...
The present thesis deals with Micro-Electro-Mechanical Systems (MEMS) optical switches for telecommunication applications. The aim is to study new type of microsystems for guided-wave optical switching applications. Two projects have been investigated. The ...
This work describes the advancements made in micro and nano patterning via stencil lithography. Stencil lithography is a resist-less and direct pattern technique where a controlled amount of material is deposited through apertures on to a substrate in a va ...
The invention relates to methods for manufacturing semiconductor devices. Processes are disclosed for implementing suspended single crystal silicon nano wires (NWs) using a combination of anisotropic and isotropic etches and spacer creation for sidewall pr ...
In the last forty years the semiconductor industry focused on the downscaling process of the CMOS (Complementary Metal-Oxide-Semiconductor) technology, trying to follow as much as possible the empirical Moore's Law. In the last five years this trend has be ...
Previous research has shown that innovation can have various sources and different forms. Innovation can thus be developed by different types of organizations or individuals for several reasons, and it can be related to product or process technologies. One ...
