Concept

Micro black hole

Related publications (122)

Femtosecond carrier dynamics in bulk graphite and graphene paper

Majed Chergui, Fabrizio Carbone, Frank van Mourik, Andrea Cannizzo, Gerald Auböck

Femtosecond white-light continuum probe transient absorption and reflectivity measurements of bulk graphite and graphene paper are reported. In graphite, the relaxation of photoinduced electron–hole pairs happens through in-plane electron–electron and elec ...

Elsevier2011

The Graphene-Gold Interface and Its Implications for Nanoelectronics

Klaus Kern, Marko Burghard, Ravi Shankar Sundaram

We combine optical microspectroscopy and electronic measurements to study how gold deposition affects the physical properties of graphene. We find that the electronic structure, the electron-phonon coupling, and the doping level in gold-plated graphene are ...

2011

FeS2-quantum-dot sensitized metal oxide photoelectrodes: photoelectrochemistry and photoinduced absorption spectroscopy

Ulf Anders Hagfeldt

TiO2, ZnO nanoparticulate(-np), and ZnO-nanorod(-nr) electrodes have been modified with FeS2 (pyrite) nanoparticles. Quantum size effect is manifested by a blue shift in both absorption and photocurrent action spectra. PIA (photoinduced absorption spectros ...

2011

Stream Carving: an Adaptive Seam Carving Algorithm

Pierre Vandergheynst, Alexandre Massoud Alahi, Daniel Domingues

We propose a new content-aware image resizing scheme, "Stream Carving", which is based on the well-known seam carving method. Our algorithm may introduce larger seams in the retargeted image, i.e. seams with a width larger than one pixel, that we call "str ...

Ieee Service Center, 445 Hoes Lane, Po Box 1331, Piscataway, Nj 08855-1331 Usa2010

Position controlled self-catalyzed growth of GaAs nanowires by molecular beam epitaxy

Anna Fontcuberta i Morral

GaAs nanowires are grown by molecular beam epitaxy using a self-catalyzed, Ga-assisted growth technique. Position control is achieved by nano-patterning a SiO2 layer with arrays of holes with a hole diameter of 85 nm and a hole pitch varying between 200 nm ...

Institute of Physics2010

Method for fabricating micromirror for barcode reader, involves forming holes having diameter less than width of arms on both side of micromirror and wafer and on edges of region separating wafer and micromirror by etching arms

Philippe Renaud, Faouzi Khechana, Nicolas Abelé

A method for fabricating a micromirror in a wafer, including the steps of: depositing and etching layers forming two arms; etching the wafer such that in the back face only a thin portion of the wafer remains in the region of formation of the micromirror a ...

2010

Decay Estimates for the One-dimensional Wave Equation with an Inverse Power Potential

Roland Donninger

We study the wave equation on the real line with a potential that falls off like vertical bar x vertical bar(-alpha) for vertical bar x vertical bar -> infinity where 2 < alpha infini ...

Oxford University Press2010

Wafer-Scale Fabrication of Thin SiN Membranes and Au Films and Membranes with Arrays of Sub-um Holes Using Nanosphere Lithography

Mona Julia Katharina Klein

In this thesis, the wafer-scale fabrication of SiN membranes, Au films and Au membranes with arrays of sub-µm holes is described. Two conceptually different processes (1) and (2) were developed, both of which are based on nanosphere lithography (NSL) with ...

EPFL2010

Single-field inflation constraints from CMB and SDSS data

Julien Lesgourgues, Fabio Finelli, Jan Hamann

We present constraints on canonical single-field inflation derived from WMAP five year, ACBAR, QUAD, BICEP data combined with the halo power spectrum from SDSS LRG7. Models with a non-scale-invariant spectrum and a red tilt n(S) < 1 are now preferred over ...

2010

Inexpensive and fast wafer-scale fabrication of nanohole arrays in thin gold ﬁlms for plasmonics

Jürgen Brugger, Harry Heinzelmann, Mona Julia Katharina Klein, Bernard Wenger, Raphaël Pugin

In this paper, a fast and inexpensive wafer-scale process for the fabrication of arrays of nanoscale holes in thin gold ﬁlms for plasmonics is shown. The process combines nanosphere lithography using spin-coated polystyrene beads with a sputter-etching pro ...

Institute of Physics2010

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