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This lecture covers the evaluation of thin film quality and resistance using various metrology techniques such as optical microscopy and resistivity meters. It explains the Van der Pauw 4-point measurement method for assessing metal film quality and calculating resistivity. The lecture also discusses the measurement of Cr resistivity in bi-morph structures and the calculation of Cr resistance based on dimensions. Additionally, it explores the use of a prober station for electronic characterization and the importance of proper test pattern design to avoid device burnout and ensure ohmic contact.