Lecture
This lecture covers lithography techniques in nanofabrication, focusing on Electron Beam Lithography (EBL) and Nano Imprint Lithography (NIL). It explains the evolution of lithography technologies, the components of an EBL system, resolution limits, EBL resists, pattern generation, imprint process, challenges in NIL, and stamp fabrication. The instructor discusses the main limitations of EBL, the imprint process, resist properties, residual layer removal, and challenges in NIL. The lecture concludes with a summary of various lithography methods and their applications.