Chemical Vapour Deposition: Thin Films & Oxidation

This lecture covers the principles of Chemical Vapour Deposition (CVD) focusing on Atomic Layer CVD (ALCVD) and its application in forming atomically specified conformal films. It also discusses the importance of SiO₂ in silicon technology, the mechanisms of thermal oxidation, and the formation of SiO₂ by diffusion of oxygen into a silicon wafer. Additionally, a case study on a thermo-mechanical micro-actuator is presented, highlighting the process of applying voltage to a Cr wire, Joule heating, thermal expansion, and the reliability concerns. The lecture concludes with a summary of the discussed topics, emphasizing the use of ALCVD for thin continuous layers, thermal oxidation, and the LOCOS process in microelectronics.