Quantum and Nanocomputing: Lithography and Simulation Techniques

This lecture covers advanced lithography techniques such as Focused Ion Beam (FIB) and Electron Beam Lithography (EBL) for nanofabrication, as well as simulation stages for circuit design, including ab-initio simulation and circuit simulation algorithms. The instructor explains the process of lithography, nanoscale patterning, and the characterization of nanometric structures. Additionally, the lecture delves into the impact of clock variations on circuit performance and the iterative self-consistent solution for circuit design. The algorithm development for charge distribution, equivalent input voltage calculations, and the importance of stability in molecular interactions are also discussed.