Lithography: General Concepts and Mask Fabrication

In course

Incididunt fugiat ipsum est occaecat dolor ipsum proident est culpa amet. Commodo amet ad duis labore deserunt irure ad dolore culpa mollit nisi reprehenderit eu velit. Aute nostrud incididunt esse magna Lorem sit minim fugiat aute laborum laborum. Sunt ad anim commodo quis occaecat. Et aliquip ipsum ullamco non irure exercitation et.

Description

This lecture introduces lithography by explaining general concepts and the fabrication of lithography masks using a direct write laser tool. It covers UV lithography, electron beam lithography, and emerging alternative lithographies, emphasizing the importance of transferring geometric shapes to radiation-sensitive material to define integrated circuit regions.

In MOOCs (3)

Instructors (2)

nostrud aute irure irure

Ex commodo aliqua do do anim in irure. Tempor id est laborum ut in veniam mollit minim nulla ea. Proident veniam consequat amet est dolor exercitation sit. Exercitation adipisicing adipisicing ullamco veniam consectetur nostrud in ullamco.

amet velit velit occaecat

Reprehenderit cupidatat magna ullamco incididunt nisi consequat nulla. Fugiat dolore laboris est irure dolore aliqua minim sit exercitation. Mollit laborum ad cupidatat ad quis voluptate est esse mollit adipisicing consequat nisi reprehenderit. Ut ipsum aliquip quis anim id. Nulla duis mollit consequat ullamco laboris duis.

Official source

https://mediaspace.epfl.ch/media/0_mp9auvms

About this result

This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.

Ontological neighbourhood

Electrical engineering

Electromechanics: Microelectromechanical systems

Related lectures (43)