Publications by Marc Antonius Friedrich van den Boogaart

Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Wiley-Blackwell2009

Structured ZnO-based contacts deposited by non-reactive rf magnetron sputtering on ultra-thin SiO2/Si through a stencil mask

Jürgen Brugger, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart

In this paper, we study the localized deposition of ZnO micro and nanostructures deposited by non-reactive rf-magnetron sputtering through a stencil mask on ultra-thin (10 nm) SiO2 layers containing a single plane of silicon nanocrystals (NCs), synthetized ...

2009

Full-wafer fabrication by nanostencil lithography of micro/nanomechanical mass sensors monolithically integrated with CMOS

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Wafer-scale nanostencil lithography (nSL) is used to define several types of silicon mechanical resonators, whose dimensions range from 20 μm down to 200 nm, monolithically integrated with CMOS circuits. We demonstrate the simultaneous patterning by nSL of ...

2008

Stencil assisted reactive ion etching for micro and nano patterning

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Stencil-assisted oxygen reactive ion etching is a low-cost and parallel process for the replication of micrometric and nanometric patterns in any organic material. This lithography process allows the patterning of organic material non sensitive to electron ...

2008

Combining micelle self-assembly with nanostencil lithography to create periodic/aperiodic micro- /nanopatterns on surfaces

Jürgen Brugger, Cyrille Hibert, Marc Antonius Friedrich van den Boogaart, Sivashankar Krishnamoorthy

Wiley2008

Charging dynamics of localized 2D layers of Si nanocrystals embedded into SiO2 by stencil masked ultra low energy ion implantation process

Jürgen Brugger, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart

2008

Mechanical stabilisation and design optimisation of masks for stencil lithography: Numerical approach and experimental validation

Jürgen Brugger, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart

This paper addresses mask deformation phenomenon that frequently occurs but is highly undesirable in stencil lithography. Previously, a technique for mechanical stabilisation of stencils was proposed [M.A.F. van den Boogaart, et al., Corrugated membranes f ...

2008

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Kristopher Pataky

Resistless processes to realize the pattern transfer of your designs into the substrate present some advantages, as the reduction in fabrication steps. Stencil Lithography (SL) is one of the most used resistless processes and, up to now, it has mainly been ...

2008

Reusability of nanostencils for the patterning of Aluminum nanostructures by selective wet etching

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena

One of the major advantages of stencil lithography is the possibility to use stencils many times. However, when stencils contain nanoapertures, the clogging of the membranes limits the useful life time of the stencils. The clogging is due to the accumulati ...

Elsevier2008

Resistivity Measurements of Gold Wires Fabricated by Stencil Lithography on Flexible Polymer Substrates

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet

We report on the patterning and characterization of titanium–gold (Ti–Au) wire test structures on polyethylene naphthalate (PEN), polyethylene terephthalate (PET) and polyimide (PI) substrates. PEN, PET and PI are flexible polymers which can withstand stre ...

Elsevier2008