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Wilfried Noell

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Related publications (67)

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Optical characterization of high numerical aperture microlenses for quality assessment and fabrication process optimization

Toralf Scharf, Wilfried Noell, Jeremy Béguelin

Accurate characterization of high numerical aperture aspheric microlenses currently is a nonstandard procedure that remains an open challenge. Here, we present and discuss a characterization method based on interferometric and point spread function measure ...

OPTICAL SOC AMER2020

Correction of spherical surface measurements by confocal microscopy

Toralf Scharf, Wilfried Noell, Jeremy Béguelin

Refractive microlenses are nowadays widely used in optical systems. Characterizing their surface is essential to ensure their quality and to optimize their fabrication process. This is realized by optical surface profilers thanks to their vertical resoluti ...

2020

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Tolerancing is an important step toward the fabrication of high-quality and cost-effective lens surfaces. It is critical for wafer-level optics, when up to tens of thousands microlenses are fabricated in parallel and whose surfaces cannot be formed individ ...

OPTICAL SOC AMER2020

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Characterizing the surface of microlenses by optical profilers has the important advantages of measurement speed, flexibility and automation. Nevertheless, the accuracy of such characterization is limited by error occurring in non-flat measurements. Here, ...

SPIE-INT SOC OPTICAL ENGINEERING2019

Spatial coherence properties of an LED-based illumination system for mask-aligner lithography

Hans Peter Herzig, Toralf Scharf, Wilfried Noell, Raoul Kirner, Johana Bernasconi

A high-power LED-based illumination system has been developed as a replacement for the mercury arc lamps used in mask-aligner lithography. LEDs are arranged in a grid array and placed in the entrance aperture of individual reflectors. Those reflectors decr ...

SPIE2019

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The uniformity of large microlens arrays in Fused Silica is governed by the production process. It comprises photolithographic patterning of a spin-coated layer of photoresist on a 200mm wafer with a molten resist reflow process and subsequent dry etching. ...

OPTICAL SOC AMER2019

Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography

Toralf Scharf, Wilfried Noell, Chen Yan, Raoul Kirner, Andreas Vetter

In proximity mask aligner photolithography, diffraction of light at the mask pattern is the predominant source for image shape distortions such as line end shortening and corner rounding. One established method to mitigate the impact of diffraction is opti ...

2019

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The optical performance of refractive plano-convex microlenses is mainly related to the quality of their (a)spherical surface. An efficient tolerancing of this surface is a key step towards the manufacturing of high quality microlenses. However, we demonst ...

SPIE-INT SOC OPTICAL ENGINEERING2019

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The wafer-level production of Fused Silica microlens arrays is limited by systematic process non-uniformities. The common molten resist-reflow process with subsequent dry-etching allows for manufacturing of microlens arrays on 200 mm wafers. A thorough pro ...

SPIE-INT SOC OPTICAL ENGINEERING2019

High power modular LED-based illumination system for lithography applications

Hans Peter Herzig, Marcel Groccia, Toralf Scharf, Wilfried Noell, Raoul Kirner, Johana Bernasconi

Mask-aligner lithography is a technology used to transfer patterns with critical dimensions in the micrometer range from below 1 micron for contact printing to a dozen of microns in proximity printing. This technology is widely used in the fabrication of M ...

2018