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Krishnaparvathy Puthankovilakam

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Krishnaparvathy Puthankovilakam

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Unified rule based correction for corners in proximity lithography mask using high resolution features

Limitations of Proximity Lithography Printing : Simulations, Experiments, and Applications

Light fields behind microstructures: study of the Babinet-principle in the Fresnel regime

Limitations of Proximity Lithography Printing : Simulations, Experiments, and Applications

Unified rule based correction for corners in proximity lithography mask using high resolution features

Light fields behind microstructures: study of the Babinet-principle in the Fresnel regime