Sebastian Gautsch

Sebastian Gautsch is section adjunct in Microengineering at EPFL. He received his M.A.Sc. Degree in Electronical physics from the University of Neuchâtel, Switzerland in 1998. He did his Ph.D. degree in the field of micro-mechanical systems at the Institute of Microtechnology (IMT), University of Neuchâtel, in 2001. His PHD thesis was done in collaboration with NASAs Jet Propulsion Laboratory (JPL) in Pasadena and led to the successful operation of an Atomic Force Microscope on the Phoenix Mission to the Planet Mars in 2008. This achievement had a broad impact in the media. In parallel to his research activities he pursued an international swimming career until 2003. He then acquired the Federal Certificate in Sport Coaching in 2007 delivered by the Swiss Olympic Federation and coached the Elite Swimming Team of Red-Fish Neuchâtel between 2004 and 2009. He was instrumental in initiating and coordinating the Cantonal Olympic Project to support potential olympians. He was part of the coaching delegation at several international events for the Swiss Swimming National Team and qualified more than 20 swimmers for European, World Championships and the Olympic Games of Beijing in 2008. Between 2004 and 2013 he successfully led the research activities in the field of Tools for Nanoscience at the Institute of Microengineering of EPFL at the Sensors, Actuators and Microsystems Laboratory (SAMLAB) of Prof. Nico de Rooij. In 2011, he led the R&D activities in Electron Beam Lithography for the Centre Suisse d'Electronique et de Microtechnique (CSEM). He was instrumental in creating the Swiss Chapter of the Mars Society in 2011 and is currently Vice President. Between 2011 and 2018 he lectured at the Bern University of Applied Science in the field of Micro and Medical Technology.Between 2012 and 2020 he coordinated the Industrial Internships Program for Master students at the School of Engineering. He was instrumental in setting up coordinated master thesis in industry, the Engineering Industry Day, and the sustainable internships label. Between 2018 and 2020 he coordinated academic outreach initiatives like the E3 research internship program and the Engineering PhD Summit . Google Scholar publication page:

About this result

This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.

Related units (1)

Related research domains (15)

Related publications (67)

Cantilever

A cantilever is a rigid structural element that extends horizontally and is supported at only one end. Typically it extends from a flat vertical surface such as a wall, to which it must be firmly attached. Like other structural elements, a cantilever can be formed as a beam, plate, truss, or slab. When subjected to a structural load at its far, unsupported end, the cantilever carries the load to the support where it applies a shear stress and a bending moment. Cantilever construction allows overhanging structures without additional support.

Electron

The electron (_Electron or _beta-) is a subatomic particle with a negative one elementary electric charge. Electrons belong to the first generation of the lepton particle family, and are generally thought to be elementary particles because they have no known components or substructure. The electron's mass is approximately 1/1836 that of the proton. Quantum mechanical properties of the electron include an intrinsic angular momentum (spin) of a half-integer value, expressed in units of the reduced Planck constant, ħ.

Electron-beam lithography

Electron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.

Comparing membrane- and cantilever-based surface stress sensors for reproducibility

Sebastian Gautsch, Nico de Rooij, Terunobu Akiyama, Peter Vettiger, Frédéric Loizeau

Point-of-care (PoC) applications require small, fast, and low power sensors with high reliability. Despite showing promising performances, nanomechanical sensors have not yet demonstrated the excellen

Elsevier2015

, , , ,

A new and versatile fabrication process of insulated gold tip probes for atomic force microscopy (AFM) is presented by Wu et al. (In-plane fabricated insulated gold-tip probe for electrochemical and m

Elsevier2014

Batch fabrication of gold-gold nanogaps by E-beam lithography and electrochemical deposition

Sebastian Gautsch, Nico de Rooij, Terunobu Akiyama, Yexian Wu

We report on the successful development of a well-controlled two-step batch nano-fabrication process to achieve nanometer-size gaps at the wafer scale. The technique is based on an optimized electron-

Institute of Physics2013