Plasma-enhanced chemical vapor depositionPlasma-enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by radio frequency (RF) (alternating current (AC)) frequency or direct current (DC) discharge between two electrodes, the space between which is filled with the reacting gases.
Asteroid impact avoidanceAsteroid impact avoidance comprises the methods by which near-Earth objects (NEO) on a potential collision course with Earth could be diverted away, preventing destructive impact events. An impact by a sufficiently large asteroid or other NEOs would cause, depending on its impact location, massive tsunamis or multiple firestorms, and an impact winter caused by the sunlight-blocking effect of large quantities of pulverized rock dust and other debris placed into the stratosphere.
