Influences of a High-Excitation Frequency (70 Mhz) in the Glow-Discharge Technique on the Process Plasma and the Properties of Hydrogenated Amorphous-Silicon
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Properties of thin films such as the crystallinity of silicon deposited from SiH4 - H-2 discharges are governed by the plasma composition. Therefore, it is crucial to measure the plasma composition in order to understand and optimize the deposition rate, d ...
We report on a study of pentacene thin-films grown by high vacuum deposition on silicon dioxide, using atomic force microscopy (AFM) and transmission electron microscopy (TEM). The nucleation density of pentacene islands on SiO2is found to rise ...
Hydrogen (H2) has raised considerable interest as a future energy carrier in its application to fuel cell driven vehicles, as it is absolutely free of polluting emissions. However, it is flammable in air and difficult to contain, for which reason innovativ ...
An experimental work has been carried out to investigate the dynamic behavior and the intensity of erosive partial cavitation on a 2-D hydrofoil. Both sheet (stable) and cloud (unstable) cavitation have been tested in a cavitation tunnel for various free s ...
The formation of sub-micron sized particulates has been studied in a low pressure (0.1 mbar) radio-frequency (13.56 MHz) capacitively coupled plasma discharge. Particles are studied in situ by infrared absorption spectroscopy, laser illumination and Cavity ...
In the frame of this thesis, two similar high current DC arc (HCDCA) plasma sources were investigated in a low gas pressure regime (10-3-10-2 mbar). One of them was initially designed for the epitaxial growth of silicon and silicon germanium (LEP), the oth ...
Light Induced Chemical Vapour Deposition (LICVD) of titanium dioxide thin films is studied in this work. It is shown that this technique enables to deposit locally and selectively a chosen crystalline phase with a precise controlled thickness at low substr ...
Oriented films of tetracene and pentacene have been obtained by high vacuum sublimation onto oriented poly(tetrafluoroethylene) (PTFE) substrates. Polymorphism, orientation, and morphology of the pentacene and tetracene films are studied as a function of d ...
Silicon and silicon nitride surfaces have been successfully terminated with carboxylic acid monolayers and investigated by atomic force microscopy (AFM) and scanning near-field optical microscopy (SNOM). On clean Si surface, AFM showed topographical variat ...
When silicon thin films are deposited by plasma enhanced chemical vapor deposition in a plasma regime close to powder formation, a new type of material, consisting of an amorphous matrix in which silicon nanocrystallites are embedded is obtained. This mate ...