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Fluoropolymer coating of medical grade poly(vinyl chloride) by plasma-enhanced chemical vapor deposition techniques

Related publications (55)

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Deposition and characterization of pulsed direct current magnetron sputtered Al95.5Cr2.5Si2 (N1-xOx) thin films

Alireza Karimi, Hossein Najafi

Aluminum rich oxynitride thin films were prepared using pulsed direct current (DC) magnetron sputtering from an Al95.5Cr2.5Si2 (at.%) target. Two series of films were deposited at 400 degrees C and 650 degrees C by changing the O-2/(O-2 + N-2) ratio in the ...

2010

The effect of deposition power on the electrical properties of Al-doped zinc oxide thin films

Santiago Serrano Guisan

We investigated the effect on the electronic properties of aluminum (Al)-zinc oxide (ZnO) films by modulating the radio frequency sputtering power. Our experimental results show that increasing the sputtering power increases the Al doping concentration, de ...

2010

Single-photon and photon-number-resolving detectors based on superconducting nanowires

Francesco Marsili

Nanowire superconducting single photon detectors (SSPDs) [1] are characterized by very high sensitivity in the near infrared (detection efficiency η up to 30%, for a dark count rate DK of few Hz), speed (up to ∼1 GHz repetition rate) and time resolution (j ...

EPFL2009

Self-consistent ICRF simulations in fully shaped anisotropic plasmas

Jonathan Graves, Wilfred Anthony Cooper, Stephan Brunner, Martin Jucker, Nicolas Mellet

For self-consistent ICRF heating simulations, four codes have been coupled: VMEC[1] provides a fully shaped, anisotropic 3D MHD equilibrium (bi- Maxwellian distribution function), transferred to Boozer coordinates by TERPSICHORE[2]. The full-wave code LEMa ...

2009

Multilayered niobium oxynitride films were deposited onto (100) Si using DC magnetron sputtering with a reactive gas pulsing process. The argon and nitrogen flows were kept constant during sputtering of a pure niobium target and the oxygen flow was pulsed ...

2008

Erbium-doped amorphous aluminum oxide layers deposited on Si or oxidized silicon substrates are promising construction pieces for future monolytic integrated optoelectronics devices. In a novel high-vacuum chemical vapor deposition setup the alumina films ...

2008

Cohesive and adhesive properties of silicon oxide barrier coatings deposited from an oxygen/hexamethyldisiloxane gas mixture by plasma enhanced chemical vapor deposition, with controlled incorporation of carbon on 12 mm thick polyethylene terephtalate film ...

2007

This contribution summarizes a number of aspects of the experimental and modelling programme at JET aimed at improving the characterization and understanding of edge localized mode (ELM) transport in the scrape-off layer (SOL). Divertor target energy depos ...

2007

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We have developed a new hybrid AFM probe combining an SU-8 polymer body with a full tungsten cantilever having a nanometric tip. The fabrication is based on surface micromachining a silicon wafer, where tungsten is sputter deposited in oxidation sharpened ...

2006

Complex Oxide Nanostructures by Pulsed Laser Deposition through Nanostencils

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

A flexible method for simultaneous nanoscale structures fabrication and patterning is described, using a combination of stencil mask and pulsed-laser deposition (PLD) techniques. A miniature shadow-mask with nano-apertures in a very thin microfabricated me ...

2004