Etching (microfabrication)Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which resists etching. In some cases, the masking material is a photoresist which has been patterned using photolithography. Other situations require a more durable mask, such as silicon nitride.
Reactive-ion etchingReactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it. A typical (parallel plate) RIE system consists of a cylindrical vacuum chamber, with a wafer platter situated in the bottom portion of the chamber.
MEMSMEMS (Microelectromechanical systems) is the technology of microscopic devices incorporating both electronic and moving parts. MEMS are made up of components between 1 and 100 micrometres in size (i.e., 0.001 to 0.1 mm), and MEMS devices generally range in size from 20 micrometres to a millimetre (i.e., 0.02 to 1.0 mm), although components arranged in arrays (e.g., digital micromirror devices) can be more than 1000 mm2.
MicrofabricationMicrofabrication is the process of fabricating miniature structures of micrometre scales and smaller. Historically, the earliest microfabrication processes were used for integrated circuit fabrication, also known as "semiconductor manufacturing" or "semiconductor device fabrication". In the last two decades microelectromechanical systems (MEMS), microsystems (European usage), micromachines (Japanese terminology) and their subfields, microfluidics/lab-on-a-chip, optical MEMS (also called MOEMS), RF MEMS, PowerMEMS, BioMEMS and their extension into nanoscale (for example NEMS, for nano electro mechanical systems) have re-used, adapted or extended microfabrication methods.
PhotoresistA photoresist (also known simply as a resist) is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronics industry. The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface.
Negative-index metamaterialNegative-index metamaterial or negative-index material (NIM) is a metamaterial whose refractive index for an electromagnetic wave has a negative value over some frequency range. NIMs are constructed of periodic basic parts called unit cells, which are usually significantly smaller than the wavelength of the externally applied electromagnetic radiation. The unit cells of the first experimentally investigated NIMs were constructed from circuit board material, or in other words, wires and dielectrics.
Tunable metamaterialA tunable metamaterial is a metamaterial with a variable response to an incident electromagnetic wave. This includes remotely controlling how an incident electromagnetic wave (EM wave) interacts with a metamaterial. This translates into the capability to determine whether the EM wave is transmitted, reflected, or absorbed. In general, the lattice structure of the tunable metamaterial is adjustable in real time, making it possible to reconfigure a metamaterial device during operation.
Phase-contrast imagingPhase-contrast imaging is a method of that has a range of different applications. It measures differences in the refractive index of different materials to differentiate between structures under analysis. In conventional light microscopy, phase contrast can be employed to distinguish between structures of similar transparency, and to examine crystals on the basis of their double refraction. This has uses in biological, medical and geological science.
Mechanical filterA mechanical filter is a signal processing filter usually used in place of an electronic filter at radio frequencies. Its purpose is the same as that of a normal electronic filter: to pass a range of signal frequencies, but to block others. The filter acts on mechanical vibrations which are the analogue of the electrical signal. At the input and output of the filter, transducers convert the electrical signal into, and then back from, these mechanical vibrations.
Acoustic metamaterialAn acoustic metamaterial, sonic crystal, or phononic crystal is a material designed to control, direct, and manipulate sound waves or phonons in gases, liquids, and solids (crystal lattices). Sound wave control is accomplished through manipulating parameters such as the bulk modulus β, density ρ, and chirality. They can be engineered to either transmit, or trap and amplify sound waves at certain frequencies. In the latter case, the material is an acoustic resonator.
