Bulk Lateral MEM Resonator on Thin SOI With High Q-Factor
Related publications (45)
Graph Chatbot
Chat with Graph Search
Ask any question about EPFL courses, lectures, exercises, research, news, etc. or try the example questions below.
DISCLAIMER: The Graph Chatbot is not programmed to provide explicit or categorical answers to your questions. Rather, it transforms your questions into API requests that are distributed across the various IT services officially administered by EPFL. Its purpose is solely to collect and recommend relevant references to content that you can explore to help you answer your questions.
The use of shadow masks (stencils) for nanopatterning overcomes the limitations typically present by patterning methods involving conventional optical lithography and etching, such as diffraction limit and etch selectivity. Nanostencils allow for resistles ...
This paper suggests a new fabrication method for surface micromachining based on porous silicon formation followed by electropolishing. in contrast to its known use as a sacrificial layer, in this work, porous silicon will be employed as constitutive mater ...
We present a simple method for fabricating nanomechanical elements with ultra high resonance frequency. The process is based on local deposition through a miniaturized shadow mask (nanostencil), followed by dry etching to release the structure from the sub ...
A monolithic silicon integrated optical micro-scanner is presented. The device consists of a mirror located on the tip of a thermal bimorph actuator beam. The fabrication process is very simple and compatible with IC fabrication techniques. The device is e ...
A monolithic silicon integrated optical micro-scanner is presented. The device consists of a mirror located an the tip of a thermal bimorph actuator beam. The fabrication process is very simple and compatible with IC fabrication techniques. The device is e ...