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Deep reactive ion etching and focused ion beam combination for nanotip fabrication

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Deep reactive ion etching and focused ion beam combination for nanotip fabrication

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High aspect ratio sub-micron trenches on silicon-on-insulator and bulk silicon

Sharp High-Aspect-Ratio AFM Tips Fabricated by a Combination of Deep Reactive Ion Etching and Focused Ion Beam Techniques

Direct polymer patterning by high energy reactive ion beam through stencil masks

Focused ion beam production of nanoelectrode arrays

Fabrication of 150 nm half-pitch grating templates for nanoimprint lithography

Ion Beam Etching: Replication of Micro Nano-structured 3D Stencil Masks

Characterization of the feature-size dependence in Ar/Cl2 chemically assisted ion beam etching of InP-based photonic crystal devices

DRIE based novel technique for AFM probes fabrication

Feature size effects in chemically assisted ion beam etching of InP-based photonic crystals

DRIE based novel technique for AFM probes fabrication

High aspect ratio sub-micron trenches on silicon-on-insulator and bulk silicon

Feature size effects in chemically assisted ion beam etching of InP-based photonic crystals

Fabrication of 150 nm half-pitch grating templates for nanoimprint lithography

Direct polymer patterning by high energy reactive ion beam through stencil masks

DRIE based novel technique for AFM probes fabrication

Sharp High-Aspect-Ratio AFM Tips Fabricated by a Combination of Deep Reactive Ion Etching and Focused Ion Beam Techniques

Characterization of the feature-size dependence in Ar/Cl2 chemically assisted ion beam etching of InP-based photonic crystal devices

Ion Beam Etching: Replication of Micro Nano-structured 3D Stencil Masks

Focused ion beam production of nanoelectrode arrays

DRIE based novel technique for AFM probes fabrication