Growth and Activation of an Amorphous Molybdenum Sulfide Hydrogen Evolving Catalyst
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We have calculated the atomistic mechanism for the HfO2 atomic layer deposition (ALD) using Hf(NEtMe)(4) and H2O precursors using density functional theory. On hydroxylated Si surface, our results show overall Hf(NEtMe)(4) half-reaction is exothermic by 1. ...
Due to the limiting amount of fossil fuel available and to the continuous growth of the world energy consumption, it becomes important to find alternative energy sources. Hydrogen produced by the photoelectrolysis of water is a perfect candidate as a clean ...
We have developed a novel strategy for localized electrochemical deposition (LECD) to improve both the lateral resolution of the process and the porosity of the fabricated high-aspect-ratio microstructures. The strategy is based on accurately controlling t ...
The deposition of copper by low pressure chem. vapor deposition (CVD) from Cu bis-hexafluoroacetylacetonate is monitored in real time and in situ by the measurement of the optical reflectivity and elec. resistance of the growing metal film. Changes of the ...
The fragmentation behaviour of a thin brittle coating attached to a ductile substrate subjected to equibiaxial quasi-static in-plane tension is studied. The experimentally observed cracking patterns are related to repetitively branching coating cracks. The ...
Localized electrochemical deposition (LECD) is an emerging technology for inexpensive and effective fabrication of high-aspect-ratio microstructure of diverse materials. Microradiology with coherent X-rays enabled study of this process in real-time. This l ...
Light Induced Chemical Vapour Deposition (LICVD) of titanium dioxide thin films is studied in this work. It is shown that this technique enables to deposit locally and selectively a chosen crystalline phase with a precise controlled thickness at low substr ...
The invention relates to an effusing source for film deposition made of a reservoir comprising one hole characterized by the fact that the hole diameter is less than one order of magnitude than the mean free path of the molecules determined by the pressure ...
ECOLE POLYTECHNIQUE FEDERALE LAUSANNE (ECOL-Non-standard) BENVENUTI G (BENV-Individual) AMOROSI S (AMOR-Individual) HALARY-WAGNER E (HALA-Individual)2002
There is a need for chemically resistant coatings that protect the exposed surface of microfluidics components. Pinhole free films with low stress and a good uniformity on flat and inclined surfaces are required. In this study, amorphous silicon carbide (S ...
We study the deposition of Ag ions, and size selected Ag/sub 7/ and Ag/sub 19/ cluster ions on Pd(100) at total kinetic energies of 20 eV and 95 eV using thermal energy atom scattering and molecular dynamics simulations. We find that at all energies Ag ato ...