Publication

Ferroelectric thin films for microsystems

Related publications (33)

Plasma-Assisted Hybrid Vapour Deposition Technology for Thin Film Fabrication

Continuous development of thin film deposition technologies is essential for the fabrication of films that meet the specific requirements of their target applications and working conditions. Therefore, it is necessary to increase the number of accessible a ...

EPFL2023

Deposition of Thin Alumina Films Containing 3D Ordered Network of Nanopores on Porous Substrates

Martina Lihter

Self-supporting thin films containing nanopores are very promising materials for use for multiple applications, especially in nanofiltration. Here, we present a method for the production of nanomembranes containing a 3D ordered network of nanopores in an a ...

2020

Enhancing solar disinfection of water in PET bottles by optimized in-situ formation of iron oxide films. From heterogeneous to homogeneous action modes with H2O2 vs. O-2 - Part 1: Iron salts as oxide precursors

César Pulgarin, Sami Rtimi, Stefanos Giannakis, Sakine Shekoohiyan

Solar disinfection (SODIS) is a WHO-accepted intervention method for improving water sources in developing countries. Despite its effectiveness, the limitations of long exposure and bacterial regrowth risk demand further improvement of the practice. In thi ...

ELSEVIER SCIENCE SA2019

Combinatorial HV-CVD survey of barium triisopropyl cyclopentadienyl and titanium tetraisopropoxide for the deposition of BaTiO3

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

Barium titanate is a very promising material for the integration of optical communication into electronic integrated circuits. For a successful integration into CMOS compatible technology, a growth process has to be found which allows forming crystalline B ...

Wiley-VCH Verlag Berlin2015

X-ray-induced Cu deposition and patterning on insulators at room temperature

Giorgio Margaritondo, Ying Chen

X-ray irradiation is shown to trigger the deposition of Cu from solution, at room temperature, on a wide variety of insulating substrates: glass, passivated Si, TiN/Ti/SiO2/Si and photoresists like PMMA and SU-8. The process is suitable for patterning and ...

International Union of Crystallography2015

X-ray-induced Cu deposition and patterning on insulators at room temperature

Giorgio Margaritondo, Ying Chen

X-ray irradiation is shown to trigger the deposition of Cu from solution, at room temperature, on a wide variety of insulating substrates: glass, passivated Si, TiN/ Ti/SiO2/Si and photoresists like PMMA and SU-8. The process is suitable for patterning and ...

2015

Solid on liquid deposition, a review of technological solutions

Roland Andreas Bitterli, Laure Jeandupeux

Solid-on-liquid deposition (SOLID) techniques are of great interest to the MEMS and NEMS (Micro- and Nano Electro Mechanical Systems) community because of potential applications in biomedical engineering, on-chip liquid trapping, tunable micro-lenses, and ...

Elsevier2015

Facile route to freestanding CH3NH3PbI3 crystals using inverse solubility

Michael Graetzel, Ulf Anders Hagfeldt, Kazuteru Nonomura, Jeannette Medina Kadro

CH3NH3PbI3 was found to exhibit inverse solubility at high temperatures in gamma-butyrolactone. Making use of this unusual, so far unreported phenomenon, we present a facile method for the growth of freestanding crystals of CH3NH3PbI3 from solution without ...

Nature Publishing Group2015

Precursor adsorption efficiency of titanium tetra isopropoxide in the presence of a barium beta-diketonate precursor

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

Barium titanate is a promising candidate for integrated photonic application due to its high electro-optic coefficient; therefore the need arises for a suitable deposition technique which provides high film quality at low temperatures (below 500 degrees C) ...

Elsevier Science Sa2013

Volatilities of Actinide and Lanthanide N,N-Dimethylaminodiboranate Chemical Vapor Deposition Precursors: A DFT Study

N,N-Dimethylaminodiboranate complexes with praseodymium, samarium, erbium, and uranium, which are potential chemical vapor deposition precursors for the deposition of metal boride and oxide thin films, have been investigated by DFT guided by field-ionizati ...

Amer Chemical Soc2012

Graph Chatbot

Chat with Graph Search

Ask any question about EPFL courses, lectures, exercises, research, news, etc. or try the example questions below.

DISCLAIMER: The Graph Chatbot is not programmed to provide explicit or categorical answers to your questions. Rather, it transforms your questions into API requests that are distributed across the various IT services officially administered by EPFL. Its purpose is solely to collect and recommend relevant references to content that you can explore to help you answer your questions.