Fabrication of complex oxide microstructures by combinatorial chemical beam vapour deposition through stencil masks
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Nanowire superconducting single photon detectors (SSPDs) [1] are characterized by very high sensitivity in the near infrared (detection efficiency η up to 30%, for a dark count rate DK of few Hz), speed (up to ∼1 GHz repetition rate) and time resolution (j ...
A growth model for the low pressure chemical vapor deposition (LPCVD) of polycrystalline ZnO thin films is proposed. This model is based on experimental observations of the surface morphology and crystallographic orientations of the layers at different thi ...
Erbium-doped amorphous aluminum oxide layers deposited on Si or oxidized silicon substrates are promising construction pieces for future monolytic integrated optoelectronics devices. In a novel high-vacuum chemical vapor deposition setup the alumina films ...
DC reactive magnetron sputtering was used for the deposition of Zr–Si–N thin films. Four series of samples have been deposited at various substrate temperatures TS: 300 K, 510 K, 710 K and 910 K. Depending on TS, different N2 partial pressures pN2 were req ...
We analyzed along this work the feasibility to produce high quality alumina thin films by High Vacuum Chemical Vapor Deposition (HV-CVD). We study the influence of various parameters on the growth process and on the film quality, such as substrate temperat ...
Barrier film for encapsulation of oxygen and moisture sensitive devices comprising a base polymer substrate and applied onto the base substrate, a barrier layer comprising an inorganic coating deposited by a vapour deposition method, characterised in that ...
Recently, some research effort has been instigated towards micro and nano patterning of curved surfaces, as system miniaturization by means of patterned planar surfaces has practically reached its limits. In contrast to the more practical approach of exist ...
Gold nanoparticles with hydrophobic surface have been deposited on a silicon substrate chemically patterned by reactive ion etching through a stencil mask and chemical vapour deposition of alkyl silanes. After deposition by dipping and adequate rinsing, th ...
Titanium aluminium nitride (TiAlN)-based coatings are designed specially for applications where oxidation and wear resistance are primary demands, as in the case of cutting tools. Moreover the coatings are required to be thermally stable as well as have go ...
When AxGa1-xAs layers are grown on V-grooved GaAs substrates by metal organic chemical vapour deposition (MOCVD), a Ga rich vertical quantum well (VQW) appears in the V-groove centre. The width and Ga enrichment of this structure depend on the nominal Al c ...