Thermal conductivity contrast measurement of fused silica exposed to low-energy femtosecond laser pulses
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Fused silica (a-SiO2) exposure to low-energy femtosecond laser pulses leads to interesting effects such as a local increase of etching rate and/or a local increase of refractive index. Up to now the exact modifications occurring in the glass matrix after e ...
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Formation of self-organized nanogratings in bulk glasses with femtosecond laser pulses is one of the most intriguing phenomena in the interactions of light with transparent materials. With the feature sizes far beyond the optical diffraction limit, these n ...
Fused silica (a-SiO 2) exposure to low-energy femtosecond laser pulses (below ablation threshold) introduces a local increase of the HF etching rate. This property has been used to fabricate a variety of structures ranging from simple fluidic channels to m ...
Recently, it was demonstrated that femtosecond lasers pulses with energies below the ablation threshold locally enhance the etching rate of fused silica: regions that are exposed to the laser beam are etched faster. This remarkable property has been used f ...