Electrochemical Quartz Crystal Microbalance and X-Ray Photoelectron Spectroscopy study of cathodic reactions in Bovine Serum Albumin containing solutions on a Physical Vapour Deposition-CoCrMo biomedical alloy
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Using a first-principles approach, we investigate the origin of the fine structure in Si 2p photoelectron spectra at the Si(100)-(2x1) surface and at the Si(100)-SiO2 interface. Calculated and measured shifts show very good agreement for both systems. By u ...
The surface electronic and mol. structure of a new org. chromophore useful for dye-sensitized nanostructured solar cells was studied by electron spectroscopy. Initially the use of a simple mol. system contg. the polyene-diphenylaniline chromophore in a sol ...
The long term performance of micro-/nano-electromechanical systems (MEMS/NEMS) depends on their stability to operating conditions, contact friction, adhesion, and wear. Aluminum (Al) substrates have been chemically reacted with perfluorodecanoic acid (PFDA ...
Tungsten plate was exposed in the TEXTOR tokamak during nitrogen-assisted discharges. In order to determine material mixing on tungsten, the plate was examined ex situ with ion beam analysis techniques including time-of-flight heavy ion elastic recoil dete ...
DC-magnetron sputtering with an Ag target on textile surfaces produced Ag particles with sizes similar to 4.7 nm (+/- 15%). Sputtering for 15 s led to Ag layers of 15-20 nm. The threshold sputtering time precluding airborne bacterial growth was about 60 s. ...
We present a combined experimental and theoretical study of the CO2 interaction with the Ni(110) surface. Photoelectron spectroscopy, temperature-programmed desorption, and high-resolution electron energy loss spectroscopy measurements are performed at dif ...
The chemical and electrochemical promotion of highly dispersed nanofilm Rh catalysts (dispersion: about 10 %, film thickness: 40 nm) has been investigated for the first time. To this end Rh metal was sputter-deposited, either on a purely ionic conductor (8 ...
The interfaces: K/Cu(115) and CO/Cu(115) have been characterized using surface sensitive techniques, including low energy electron diffraction and photoelectron spectroscopy. K adatoms show tendency to occupy the sites close to the step edges. At low tempe ...
CsI thin film photocathodes of 600 nm thickness deposited on polished Al surfaces by resistive evaporation technique were studied by angle-resolved X-ray photoelectron spectroscopy (ARXPS), before and after UV-irradiation under vacuum. It is shown that the ...
The adsorption of trimesic acid (TMA) on Cu(110) has been studied in the temperature range between 130 and 550 K and for coverages up to one monolayer. We combine scanning tunneling microscopy (STM), low-energy electron diffraction (LEED), reflection absor ...