Strategies for Doped Nanocrystalline Silicon Integration in Silicon Heterojunction Solar Cells

Carrier collection in silicon heterojunction (SHJ) solar cells is usually achieved by doped amorphous silicon layers of a few nanometers, deposited at opposite sides of the crystalline silicon wafer. These layers are often defect-rich, resulting in modest doping efficiencies, parasitic optical absorption when applied at the front of solar cells, and high contact resistivities with the adjacent transparent electrodes. Their substitution by equally thin doped nanocrystalline silicon layers has often been argued to resolve these drawbacks. However, low-temperature deposition of highly crystalline doped layers of such thickness on amorphous surfaces demands sophisticated deposition engineering. In this paper, we review and discuss different strategies to facilitate the nucleation of nanocrystalline silicon layers and assess their compatibility with SHJ solar cell fabrication. We also implement the obtained layers into devices, yielding solar cells with fill factor values of over 79% and efficiencies of over 21.1%, clearly underlining the promise this material holds for SHJ solar cell applications.

Full-Area Passivating Contacts with High and Low Thermal Budgets: Solutions for High Efficiency c-Si Solar Cells

Gizem Nogay

Today more than 90% of the global PV market is covered by c-Si solar cells which are limited by recombination losses at the metal-semiconductor interface. This recombination path can be avoided by separating the metal from the c-Si wafer by introducing a buffer layer that passivates electronically the wafer surface while still allowing the flow of one type of carrier. Such structures are called carrier selective passivating contacts. In the scope of this thesis, carrier selective passivating contacts with low and high thermal budgets are investigated with the purpose of achieving a good understanding of the junction formation, the working principle, limiting factors, and integration requirements. Silicon heterojunction (SHJ) solar cells are studied as representatives for solar cells processed with low thermal budget. Solar cells with interfacial oxide contacts are investigated as the cell concept for high thermal budgets. To be industrially relevant, contact formation of the latter is studied with p-type wafers. The carrier selective passivating contacts based on microcrystalline silicon (mc-Si:H) are studied for SHJ solar cells with low thermal budget. It is demonstrated that mc-Si:H layers improve the optical and electrical performance of the SHJ solar cells compared to cells with purely amorphous contacts. However, as the layer crystallinity increases with thickness, a trade¿off between short circuit current density and fill factor is encountered. By combining a MoOx front hole-contact and a mc-Si:H(n) rear electron-contact, this trade¿off is avoided. Applying an electrodeposited copper front metallization, a short circuit current density of 38.9 mA/cm2 and a fill factor of to 80% are obtained leading to an efficiency of 22.5%. The passivating hole contacts with high thermal budget are developed using a chemically grown oxide (SiOx) and boron doped silicon-carbide which is deposited under Si-rich conditions by plasma enhanced chemical vapour deposition. It is observed that introducing an undoped Si inter¿layer between SiOx and SiCx(p) is necessary to prevent chemical reaction between carbon atoms in the SiCx(p) and the adjacent SiOx, and consequently to obtain wellpassivated SiOx/c-Si interface. With this contact structure, an implied open circuit voltage value of 718 mV and a specific contact resistivity value of 17m cm2 are attained. The contact structure is tested at device level by realizing proof-of-concept hybrid solar cells that feature a high thermal budget rear hole-contact and a low thermal budget SHJ front electron-contact. With this concept, the fill factor of 81.8% is attained. In an effort to improve the hole-contact property further, in-situ incorporation of fluorine into the boron-doped hole-contact is explored. It is observed that in the as-deposited state, fluorine is evenly distributed within the contact layer of SiCx:F(p). Upon annealing, fluorine diffuses toward the c-Si wafer and accumulates at the interface where it reduces the defect states. With this contact structure, implied open circuit voltage values up to 735mV are achieved. The potential of the fluorinated hole-contact is investigated at device level by realizing both sides-contacted co-processed solar. For this purpose in-situ phosphorous doped SiCx(n) layers were developed as a front contact. Planar, both sides-contacted p-type solar cells attain an impressive fill factor value of 84% and an open circuit voltage of 727 mV.

EPFL2018

Transparent Passivating Contacts for Front Side Application in Crystalline Silicon Solar Cells

Josua Andreas Stückelberger

In this thesis, we present the development and characterization of novel approaches to carrier-selective passivating contacts for crystalline silicon (c-Si) solar cells. In our first approach, we benefit from a wide-bandgap material, namely mixed-phase silicon oxide (SiOx). High hydrogen dilution during the plasma-enhanced chemical vapor deposition of a SiOx layer leads to the growth of vertically oriented silicon filaments embedded in a silicon oxide matrix. The resulting mixed-phase material combines transparency and vertical conduction through the layer. We propose a layered contact structure starting with an ultra-thin chemically grown SiOx (~1.2 nm) at the c-Si wafer surface, followed by a phosphorus-doped bilayer of the mixed-phase SiOx, finishing with a nanocrystalline silicon layer that ensures contact with the metallization. With such a stack, an electron-selective passivating contact with a saturation current density J0 of 5.3 fA/cm2 is achieved on n-type wafers with hydrogenation, whereas on p-type wafers the contact reached 5.8 fA/cm2 even without hydrogenation. The contact is analyzed in detail with respect to its structure and its change upon thermal treatment. Two different growth regions are detected: one with the vertically oriented silicon inclusions and a second one in which the silicon phases have more lateral growth. Crystallization and atomic redistribution are analyzed during in-situ annealing in an electron microscope, leading to a better understanding of the change in distribution of phosphorus and oxygen as well as the nucleation sites. The influence of the annealing temperatures and dwell times as well as the initial doping concentration on the resulting in-diffused region and the passivation quality is reported. We use simulations to relate the influence of these parameters on passivation to the different recombination mechanisms. From the analyzed phosphorus doping profiles, an interesting observation is reported. The chemical oxide varies in thickness and density depending on the wafer polarity as well as the base resistivity. Proof-of-concept cells including this novel structure demonstrate the suitability for electron-selective passivating contacts at the device level with conversion efficiencies of 19.0% on planar wafers and 20.1% on textured wafers. Promisingly high short-circuit current densities (Jsc) of 35 mA/cm2 (40 mA/cm2) on planar (textured) with low parasitic absorption indicate its potential as a front contact in next-generation solar cells. Additionally, the beneficial feature of the smooth refractive index change within the layers that leads to a low reflectance over a broad wavelength range, similar to a built-in anti-reflection coating, is presented. A second approach to reach highly transparent electron-selective passivating contacts is demonstrated by the use of a plasma process based on the precursor gases phosphine (PH3), silicon tetrafluoride (SiF4), hydrogen (H2), and argon (Ar). The beneficial effect of fluorine in terms of passivation without the need for additional hydrogenation processes is shown, reaching implied open-circuit voltages of 730 mV on planar surfaces and 707 mV on textured surfaces. These layers are implemented in first proof-of-concept working devices with efficiencies of 19.5% on single-side-textured wafers and Jsc values of up to 40 mA/cm2.

EPFL2018

Electrical Losses Mitigation in Silicon Heterojunction Solar Cells

Laurie-Lou Senaud

To overcome the worldwide challenges of climate change, photovoltaics is foreseen to play a significant role in the world electricity production. Nowadays, single junction crystalline silicon (c-Si) based solar cells hold the largest share of the global photovoltaic market. To achieve their maximum energy conversion efficiency, carrier-selective passivating contacts have been demonstrated to be the most promising technologies. Among them, silicon heterojunction (SHJ) solar cells are expected to further reduce the cost of photovoltaics. Indeed, they have achieved record efficiency thanks to high c-Si bulk quality and excellent full area surface passivation. However, despite remarkable performance, the material layers used to build SHJ cells are at the origin of significant trade-offs between electrical and optical properties. In particular, the properties coupling arising between the layers can cause significant electrical transport losses, strongly capping the SHJ device performance. The aim of this thesis is to accurately describe, quantify, and mitigate the electrical losses occurring in SHJ solar cells by means of advanced methodologies and characterization methods.Key outcomes of this work are fourfold. First, we introduce a generalized and unambiguous description of the concept of contact using the terminology of shell. Then, we propose a characterization methodology using two new approaches named top-down and bottom-up, designed to independently track the properties of the material layers used to build the shells, as well as the performance of the solar cells incorporating the shells. This was shown to allow one to accurately investigate and mitigate the electrical and optical losses affecting solar cells. Secondly, we present transfer length method (TLM) measurements under variable illumination as a novel advanced characterization method to study the electrical transport losses in SHJ devices. We demonstrated (i) that illumination, i.e., the injected carrier density inside the c-Si bulk, has a strong impact on the contact resistivity (rc), (ii) the importance of measuring rc under maximum power point conditions for a relevant characterization of transport losses, and (iii) how the dependence of the rc on the injected carrier density enables the comparison of the illumination response of different SHJ shells. In addition, we conducted preliminary investigations of the applicability of TLM under illumination to measure p-type shell parts on n-type c-Si wafers. Thirdly, we engineered various material layers and studied their properties. Multilayering the thin hydrogenated silicon and the TCO layers demonstrated a high potential for electrical losses mitigation by (i) improving the properties coupling in the shell, (ii) addressing the constraints of the device architecture, and (iii) mitigating the trade-offs impacting solar cell performance. Finally, the last outcome is the integration of the most promising shells in actual baseline solar cells. This resulted in fill-factors up to 83.2%, for 6-inch SHJ cells, and in efficiencies up to 25.45% for SHJ IBC cells. Finally, combining optimal electrical and optical shell properties, an impressive efficiency of 24.24% was achieved using an aluminium-doped zinc oxide as rear TCO. The advanced methodologies and characterization methods presented in this work are foreseen to drive the understanding and optimization of other solar cell technologies such as, e.g. TOPCon or tandem solar cells.

EPFL2021

Full-Area Passivating Contacts with High and Low Thermal Budgets: Solutions for High Efficiency c-Si Solar Cells

Gizem Nogay

EPFL2018

Electrical Losses Mitigation in Silicon Heterojunction Solar Cells

Laurie-Lou Senaud

EPFL2021

Transparent Passivating Contacts for Front Side Application in Crystalline Silicon Solar Cells

Josua Andreas Stückelberger

EPFL2018